Ms. Diane Markoya Profile

Diane Markoya

at ASML

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 7 March 2008 Paper

High-n immersion lithography

Harry Sewell, Jan Mulkens, Paul Graeupner, Diane McCafferty, Louis Markoya, Sjoerd Donders, Rogier Cortie, Ralph Meijers, Fabrizio Evangelista, Nandarisi Samarakone

Proceedings Volume 6924, 692415 (2008) https://doi.org/10.1117/12.773071

KEYWORDS: Semiconducting wafers, Water, Contamination, Absorption, Microfluidics, Immersion lithography, Transparency, Optical components, Ultraviolet radiation, Pulsed laser operation

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Proceedings Article | 27 March 2007 Paper

Extending immersion lithography with high-index materials: results of a feasibility study

Harry Sewell, Jan Mulkens, Paul Graeupner, Diane McCafferty, Louis Markoya, Sjoerd Donders, Nandasiri Samarakone, Rudiger Duesing

Proceedings Volume 6520, 65201M (2007) https://doi.org/10.1117/12.711139

KEYWORDS: Microfluidics, Absorption, Semiconducting wafers, Neodymium, Water, Immersion lithography, Refractive index, Critical dimension metrology, Glasses, Contamination

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Proceedings Article | 15 March 2006 Paper

The next phase for immersion lithography

Harry Sewell, Jan Mulkens, Diane McCafferty, Louis Markoya, Bob Streefkerk, Paul Graeupner

Proceedings Volume 6154, 615406 (2006) https://doi.org/10.1117/12.657574

KEYWORDS: Semiconducting wafers, Neodymium, Refractive index, Water, Immersion lithography, Microfluidics, Optical lithography, Critical dimension metrology, Absorption, Glasses

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SPIE Journal Paper | 1 July 2005

Imaging of 32-nm 1:1 lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a k₁ of 0.25

Roger French, Harry Sewell, Min Yang, Sheng Peng, Diane McCafferty, Weiming Qiu, Robert Wheland, Michael Lemon, Louis Markoya, Michael Crawford

JM3, Vol. 4, Issue 03, 031103, (July 2005) https://doi.org/10.1117/12.10.1117/1.2039953

KEYWORDS: Refractive index, Water, Oscillators, Absorption, Absorbance, Lithography, Immersion lithography, Microfluidics, Microfluidic imaging, Glasses

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Proceedings Article | 4 May 2005 Paper

32nm node technology development using interference immersion lithography

Harry Sewell, Diane McCafferty, Louis Markoya, Eric Hendrickx, Jan Hermans, Kurt Ronse

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601012

KEYWORDS: Refractive index, Immersion lithography, Lithography, Polarization, Water, Image resolution, Imaging systems, Printing, Glasses, Absorption

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Proceedings Article | 28 May 2004 Paper

Full field imaging with a 157-nm scanner

Chris Robinson, Nakgeuon Seong, Kurt Kimmel, Timothy Brunner, Michael Hibbs, Michael Lercel, Diane McCafferty, Harry Sewell, Timothy O'Neil, Juan Ivaldi, Keith Andresen

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537447

KEYWORDS: Reticles, Critical dimension metrology, Photomasks, Binary data, Lithography, Scanners, Scanning electron microscopy, Phase shifts, Semiconducting wafers, Optical lithography

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Proceedings Article | 26 June 2003 Paper

Evaluation of SCAA mask technology as a pathway to the 65-nm node

James Beach, John Petersen, Mark Maslow, David Gerold, Diane McCafferty

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485413

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Scanners, Overlay metrology, Optical proximity correction, Fiber optic illuminators, Phase shifts, Quartz, Lithographic illumination

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Proceedings Article | 26 June 2003 Paper

157-nm Micrascan VII initial lithography results

Harry Sewell, Bruce Tirri, Timothy O'Neil, Thomas Fahey, Diane McCafferty, Paul Reid, James McClay

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485423

KEYWORDS: Reticles, Pellicles, Semiconducting wafers, Lithography, Silicon, Oxygen, Absorption, Projection systems, Wafer-level optics, Nitrogen

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Proceedings Article | 16 July 2002 Paper

Exploring the resolution limits of phase-shift mask lithography with a very high numerical aperture ArF step-and-scan system

Harry Sewell, Pankaj Raval, Diane McCafferty

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473481

KEYWORDS: Photomasks, Binary data, Lithography, Printing, Diffraction, Apodization, Optical lithography, Optical resolution, Wavefronts, Reticles

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Proceedings Article | 22 August 2001 Paper

Evaluation of the dual-exposure technique

Harry Sewell, Victor Bunze, Nicholas DeLuca, Diane McCafferty

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436758

KEYWORDS: Reticles, Semiconducting wafers, Photomasks, Optical alignment, Distortion, Lithography, Double patterning technology, Wafer-level optics, Optical lithography, Lithographic illumination

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Proceedings Article | 7 July 1997 Paper

Micrascan III: performance of a third-generation catadioptric step-and-scan lithographic tool

Daniel Cote, Keith Andresen, David Cronin, Hilary Harrold, Marc Himel, J. Kane, Joe Lyons, Louis Markoya, Christopher Mason, Diane McCafferty, Matthew McCarthy, Geoffrey O'Connor, Harry Sewell, David Williamson

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276001

KEYWORDS: Combined lens-mirror systems, Lithography, Imaging systems, Optical lithography, Reticles, Semiconducting wafers, Fiber optic illuminators, Image resolution, Image quality

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Proceedings Article | 21 May 1996 Paper

Benchmarking multimode CD-SEM metrology to 180 nm

Kevin Monahan, Farid Askary, Richard Elliott, Randy Forcier, Rich Quattrini, Brian Sheumaker, Jason Yee, Herschel Marchman, Robert Bennett, Steven Carlson, Harry Sewell, Diane McCafferty, Javed Sumra, Jane Yan

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240105

KEYWORDS: Scanning electron microscopy, Metrology, Semiconducting wafers, Lithography, Reticles, Deep ultraviolet, Atomic force microscopy, Critical dimension metrology, Silicon, Calibration

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Showing 5 of 12 publications

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