Dr. Diederik J. Maas
Systems Engineer at TNO
SPIE Involvement:
Author
Area of Expertise:
Charged Particle Optics , Scanning Electron Microscopy , Scanning Helium ion Microscopy , Nano-imaging and -fabrication , Metrology
Websites:
Profile Summary

Dr. D.J. Maas is presently Senior Systems Architect with TNO Science and Industry. From 1998-2006 he was Senior Scientist at Philips Research, where he developed an Electrostatic Aberration Corrector for LV-SEM.
He has obtained is PhD degree from the University of Amsterdam for work that was performed at AMOLF involving coherent control of atomic and molecular excitations using chirped ultrashort infrared laser pulses.
His undergraduate work involved experimental studies of the fractional quantum Hall effect on quantum dots that he made using electron beam lithography (See front cover Physics Today March 2002).
Publications (12)

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Particles, Scattering, Scatterometry, Defect detection, Scanning electron microscopy, Scanners, Signal detection, Optical metrology, Semiconducting wafers

Proceedings Article | 26 June 2017 Paper
Proc. SPIE. 10329, Optical Measurement Systems for Industrial Inspection X
KEYWORDS: Metrology, Manufacturing, Scanners, Latex, Optical spheres, Particles, Semiconducting wafers, Scanning electron microscopy, Signal detection, Speckle, Wafer-level optics, Silicon, Reticles, Inspection, Defect detection, Atomic force microscopy, Contamination control, Defect inspection, Optical microscopy, Particle contamination

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Sensors, Molecules, Process control, Contamination, Manufacturing, Extreme ultraviolet, Carbon, Yield improvement, Vacuum equipment, Vacuum deposition, Ions, Xenon, Semiconducting wafers, Scanning electron microscopy, Krypton, Semiconductor manufacturing

Proceedings Article | 4 April 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Extreme ultraviolet, Sensors, Extreme ultraviolet lithography, Xenon, Carbon, Photons, Neodymium, Electron beam lithography, Ultraviolet radiation, Plasma

Proceedings Article | 20 March 2015 Paper
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Ions, Point spread functions, Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Metrology, Ion beam lithography, Helium, Electron beam lithography, Optimization (mathematics)

Showing 5 of 12 publications
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