Dr. Dieter Nees Profile

Dr. Dieter Nees

Senior Scientist at JOANNEUM RESEARCH Forschungsgesellschaft mbH

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Author

Publications (4)

Proceedings Article | 14 March 2018 Presentation

R2R fabrication of freeform micro-optics (Conference Presentation)

Ursula Palfinger, Ladislav Kuna, Dieter Nees, Stephan Ruttloff, Johannes Götz, Barbara Stadlober

Proceedings Volume 10520, 105200J (2018) https://doi.org/10.1117/12.2295784

KEYWORDS: Micro optics, Nanoimprint lithography, Lithography, Ultraviolet radiation, Optical lithography, Nano optics, Photovoltaics, Solar cells, Lenses, Mirrors

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Proceedings Article | 22 March 2016 Paper

Experiments towards establishing of design rules for R2R-UV-NIL with polymer working shims

Dieter Nees, Stephan Ruttloff, Ursula Palfinger, Barbara Stadlober

Proceedings Volume 9777, 97770D (2016) https://doi.org/10.1117/12.2218134

KEYWORDS: Polymers, Lithography, Nanoimprint lithography, Optical lithography, Manufacturing, Silicon, Critical dimension metrology, Nickel, Photomicroscopy, Coating, Scanning electron microscopy

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SPIE Journal Paper | 21 October 2014

Inkjetable and photo-curable resists for large-area and high-throughput roll-to-roll nanoimprint lithography

Manuel Thesen, Dieter Nees, Stephan Ruttloff, Maximilian Rumler, Mathias Rommel, Florian Schlachter, Susanne Grützner, Marko Vogler, Arne Schleunitz, Gabi Grützner

JM3, Vol. 13, Issue 04, 043003, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043003

KEYWORDS: Nanoimprint lithography, Etching, Silicon, Dry etching, Polymers, Photoresist processing, Nickel, Inkjet technology, Nanostructures, Reactive ion etching

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Proceedings Article | 28 March 2014 Paper

Enabling large area and high throughput roll-to-roll NIL by novel inkjetable and photo-curable NIL resists

Manuel Thesen, Maximilian Rumler, Florian Schlachter, Susanne Grützner, Christian Moormann, Mathias Rommel, Dieter Nees, Stephan Ruttloff, Stefan Pfirrmann, Marko Vogler, Arne Schleunitz, Gabi Grützner

Proceedings Volume 9049, 90490H (2014) https://doi.org/10.1117/12.2046279

KEYWORDS: Nanoimprint lithography, Etching, Dry etching, Silicon, Photoresist processing, Positron emission tomography, Surface roughness, Semiconducting wafers, Nanostructures, Refractive index

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