Dr. Dirk Beyer
Senior Product Manager at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 12 October 2020 Poster + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Diffraction, Reticles, Metrology, Logic, Sensors, Etching, Scanners, Photomasks, Optical alignment, Overlay metrology

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Reticles, Sensors, Scanners, Image registration, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Metrology, Sensors, Etching, Scanners, Image registration, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 12 June 2018 Paper
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Deep ultraviolet, Scanners, Distortion, Image registration, Pellicles, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 16 October 2017 Presentation
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Metrology, Optical parametric oscillators, Manufacturing, Image restoration, Image registration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Overlay metrology

Showing 5 of 24 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top