Dr. Dirk Hellweg
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 10 June 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Metrology, Imaging systems, Image processing, Scanners, Pellicles, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 2 January 2019 Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Metrology, Contamination, Imaging systems, Scanners, Particles, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 23 October 2018 Presentation + Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Metrology, Image processing, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, 3D image processing, 193nm lithography

SPIE Journal Paper | 17 September 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line width roughness, Photomasks, Extreme ultraviolet, Semiconducting wafers, Scanning electron microscopy, Stochastic processes, Speckle, Scanners, Extreme ultraviolet lithography, Metrology

Proceedings Article | 27 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Speckle, Image processing, Scanners, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

Showing 5 of 22 publications
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