With state-of-the-art EUV lithography moving to the 3 and 2 nm nodes, yield control and connected to that particle contamination control are crucial aspect of High-Volume Manufacturing (HVM). While much progress has been made in recent years, the continuously tightening node requirements translate into ever more stringent requirements on particle contamination control. Besides for lithographic scanners, operating in a low background pressure hydrogen gas environment, particle contamination control is also important for space exploration (which also operates in low pressure environments), where particles may lead to malfunctioning moving parts, loss of solar power generation, and human health hazards. A key factor in release of particles in these low-pressure environments is the ionization of the low-pressure background gas by energetic photons (for instance EUV in lithographic scanners, and broadband energetic radiation in space), and resulting plasma with fast electrons of 25 eV and above. Experiments show that these electrons can mobilize and remove particles on most materials, and that the governing effects strongly depend on the substrate material, coating and surface finishing. This paper will discuss work on understanding and modeling these effects and describe possible solution paths to improve particle contamination control, both for lithographic scanners and for space exploration.
Extreme ultraviolet (EUV) lithography is a technology for high volume manufacturing (HVM) of integrated circuits. HVM defines critical specification for cleanliness of reticles (masks) used to impose a pattern on wafers. EUV-induced hydrogen plasma produced by photoionization of the H2 gas by the 13.5 nm photons plays an important role in the release and transport of particles from contaminated surfaces to the reticle. It was observed that the rate of particle deposition on the reticle in an EUV scanner scales with EUV power which in turn defines the properties of the EUV-induced plasma to increase the knowledge regarding this phenomenon. We demonstrate images, acquired by a scanning electron microscopy (SEM) to illustrate morphological changes, accumulating in particles of tin, lead and lead oxide that were subject to applied hydrogen plasma (non-EUV). These changes led to the potential loss of adhesion of these materials to the relevant surfaces or potential defectivity outbreaks via explosive fragmentation. This work proposes that the mechanical stress in particles' material lattice caused by accumulation of hydrogen bubbles under the surface plays the major role in the morphological changes observed.
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