Mr. Donald J. Samuels Profile

Donald J. Samuels

Retired

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 23 October 2017 Paper

The impact of inconsistency in assist feature generation on OPC performance

Amr Abdo, Ramya Viswanathan, Donald Samuels, David Conklin

Proceedings Volume 10451, 104510V (2017) https://doi.org/10.1117/12.2281968

KEYWORDS: SRAF, Semiconducting wafers, Data modeling, Optical proximity correction, Photomasks, Printing, Resolution enhancement technologies, Optical lithography, Critical dimension metrology, Performance modeling

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Proceedings Article | 17 October 2008 Paper

Single exposure is still alive: gate patterning at 45nm technology node

Klaus Herold, Donald Samuels, Derren Dunn, Amr Abdo, Chandrasekhar Sarma

Proceedings Volume 7122, 71220W (2008) https://doi.org/10.1117/12.801526

KEYWORDS: Optical proximity correction, Optical lithography, Etching, Double patterning technology, Process modeling, Photomasks, Semiconducting wafers, Computer simulations, Tolerancing, Manufacturing

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Proceedings Article | 4 March 2008 Paper

DfM lessons learned from altPSM design

Lars Liebmann, Zak Baum, Ioana Graur, Don Samuels

Proceedings Volume 6925, 69250C (2008) https://doi.org/10.1117/12.771974

KEYWORDS: Design for manufacturing, Lithography, Photomasks, Manufacturing, Phase shifts, Design for manufacturability, Process modeling, Optical proximity correction, Optimization (mathematics), Model-based design

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Proceedings Article | 30 October 2007 Paper

Better on wafer performance and mask manufacturability of contacts with no or non-traditional serifs

Donald Samuels, Ian Stobert

Proceedings Volume 6730, 67302S (2007) https://doi.org/10.1117/12.747406

KEYWORDS: Optical proximity correction, Photomasks, Inspection, Semiconducting wafers, Manufacturing, Printing, Optical lithography, Critical dimension metrology, Chemical elements, Semiconductors

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Proceedings Article | 30 October 2007 Paper

Exploring the sources of MEEF in contact SRAMs

Emily Gallagher, Ian Stobert, Masaru Higuchi, Donald Samuels

Proceedings Volume 6730, 67302I (2007) https://doi.org/10.1117/12.746801

KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Critical dimension metrology, Optical proximity correction, Opacity, Line edge roughness, Lithography, Scanning electron microscopy, Error analysis

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Proceedings Article | 24 March 2006 Paper

Characterization of across-device linewidth variation (ADLV) for 65-nm logic SRAM using CDSEM and linewidth roughness algorithms

W. Chu, C. Radens, B. Dirahoui, I. Grauer, D. Samuels, S. Credendino, A. Nomura, R. Cornell

Proceedings Volume 6152, 61520Y (2006) https://doi.org/10.1117/12.663446

KEYWORDS: Critical dimension metrology, Transistors, Semiconducting wafers, Scanning electron microscopy, Optical proximity correction, Resolution enhancement technologies, Logic, Line width roughness, Transmission electron microscopy, Printing

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Proceedings Article | 14 March 2006 Paper

Meeting critical gate linewidth control needs at the 65 nm node

Arpan Mahorowala, Scott Halle, Allen Gabor, William Chu, Alexandra Barberet, Donald Samuels, Amr Abdo, Len Tsou, Wendy Yan, Seiji Iseda, Kaushal Patel, Bachir Dirahoui, Asuka Nomura, Ishtiaq Ahsan, Faisal Azam, Gary Berg, Andrew Brendler, Jeffrey Zimmerman, Tom Faure

Proceedings Volume 6156, 61560M (2006) https://doi.org/10.1117/12.659427

KEYWORDS: Critical dimension metrology, Etching, Semiconducting wafers, Photomasks, Optical proximity correction, Lithography, Cadmium, Reticles, Control systems, Immersion lithography

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Proceedings Article | 5 May 2005 Paper

Process-window sensitive full-chip inspection for design-to-silicon optimization in the sub-wavelength era

Mary Jane Brodsky, Scott Halle, Vickie Jophlin-Gut, Lars Liebmann, Don Samuels, Gary Crispo, Kourosh Nafisi, Vijay Ramani, Ingrid Peterson

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.599865

KEYWORDS: Reticles, Inspection, Modulation, Resolution enhancement technologies, Optical proximity correction, Photomasks, Semiconducting wafers, Lithography, Manufacturing, Optical lithography

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Proceedings Article | 3 May 2004 Paper

Image fidelity verification: contourIFV

Ioana Graur, Rama Singh, Donald Samuels

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.537490

KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Semiconducting wafers, Photomasks, Image processing, Edge roughness, Optical lithography, Model-based design, Lithography, Image enhancement

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Proceedings Article | 14 September 2001 Paper

Process dependencies of optical proximity corrections

Franz Zach, Donald Samuels, Alan Thomas, Shahid Butt

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435660

KEYWORDS: Optical proximity correction, Photomasks, Etching, Critical dimension metrology, Reticles, Photoresist processing, Semiconducting wafers, Optics manufacturing, Manufacturing, Image processing

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Proceedings Article | 26 July 1999 Paper

Approach to pattern aspect ratio control

Alan Thomas, Franz Zach, Alfred Wong, Richard Ferguson, Donald Samuels, Rosemary Longo, John Zhu, Christopher Feild

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354403

KEYWORDS: Photomasks, Capacitors, Manufacturing, Scanning electron microscopy, Photoresist processing, Tolerancing, Image processing, Diffusion, Semiconductors, Computer simulations

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Proceedings Article | 7 July 1997 Paper

Challenge of 1-Gb DRAM development when using optical lithography

Timothy Farrell, Ronald Nunes, Donald Samuels, Alan Thomas, Richard Ferguson, Antoinette Molless, Alfred Wong, Will Conley, Donald Wheeler, Santo Credendino, Munir Naeem, Peter Hoh, Zhijian Lu

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275974

KEYWORDS: Lithography, Optical lithography, Optics manufacturing, Photoresist processing, Photomasks, Software development, Semiconductors, Prototyping, Manufacturing, Lithographic illumination

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Proceedings Article | 7 June 1996 Paper

Pattern transfer at k1=0.5: get 0.25-um lithography ready for manufacturing

Wilhelm Maurer, Kimihiro Satoh, Donald Samuels, Thomas Fischer

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240904

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Chromium, Manufacturing, Photoresist processing, Scanning electron microscopy, Image processing, Etching, Printing

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Proceedings Article | 7 June 1996 Paper

Viability of conventional high-NA KrF imaging for sub-0.25-um lithography

Timothy Farrell, Ronald Nunes, Robert Campbell, Peter Hoh, Donald Samuels, Joseph Kirk, Will Conley, Junichiro Iba, Tsuyoshi Shibata

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240943

KEYWORDS: Lithography, Monochromatic aberrations, Photoresist processing, Semiconductors, Photomasks, Lithographic illumination, Excimer lasers, Semiconducting wafers, Photomicroscopy, Reflectivity

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Proceedings Article | 8 December 1995 Paper

Good OPC, where will this drive mask CD tolerance and mask grid size

Donald Samuels, Wilhelm Maurer, Timothy Farrell

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228213

KEYWORDS: Photomasks, Optical proximity correction, Critical dimension metrology, Lithography, Sodium, Semiconducting wafers, Tolerancing, Scanning electron microscopy, Manufacturing, Semiconductors

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Proceedings Article | 3 July 1995 Paper

Electrical characterization of across-field lithographic performance for 256-Mbit DRAM technologies

Junichiro Iba, Kohji Hashimoto, Richard Ferguson, Toshiaki Yanagisawa, Donald Samuels

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212761

KEYWORDS: Photomasks, Lithography, Critical dimension metrology, Resolution enhancement technologies, Mask making, Reticles, Phase shifts, Deep ultraviolet, Semiconducting wafers, Semiconductors

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