Dr. Dong-Heok Park Profile

Dr. Dong-Heok Park

at Hynix Semiconductor Inc

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 10 April 2009 Paper

Reflection control for immersion lithography: a single organic antireflectant over high-reflective substrates for double patterning

Sabrina Wong, Jeong Yun Yu, Sue Ryeon Kim, Mike Mori, Amy Kwok, Kathleen O'Connell, George Barclay, Ki Lyoung Lee, Sung Koo Lee, Cheol Kyu Bok

Proceedings Volume 7273, 727318 (2009) https://doi.org/10.1117/12.816448

KEYWORDS: Reflectivity, Double patterning technology, Immersion lithography, Multilayers, Silicon, Interfaces, Optical lithography, Lithography, Etching, Control systems

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Proceedings Article | 26 March 2008 Paper

Development of new BARC for immersion process using hyper NA

Hyo Jung Roh, Man Ho Han, Sang Jeoung Kim, Hyun Jin Kim, Jaehyun Kim, Keun Kyu Kong, Ki Lyoung Lee, Sung Koo Lee, Dong Heok Park

Proceedings Volume 6923, 69232T (2008) https://doi.org/10.1117/12.776801

KEYWORDS: Reflectivity, Etching, Refractive index, Semiconductors, Photoresist processing, Polymers, Lithography, Photorefractive polymers, Photoresist materials, Materials processing

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Proceedings Article | 26 March 2008 Paper

Optimization of BARC process for hyper-NA immersion lithography

Kilyoung Lee, Junghyung Lee, Sungkoo Lee, Dongheok Park, Cheolkyu Bok, Seungchan Moon

Proceedings Volume 6923, 69232R (2008) https://doi.org/10.1117/12.771957

KEYWORDS: Reflectivity, Photoresist materials, Etching, Immersion lithography, System on a chip, Lithography, Polarization, Carbon, Process control, Polymers

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Proceedings Article | 21 March 2006 Paper

Implementation of contact hole patterning performance with KrF resist flow process for 60nm node DRAM application

Hyoung-ryeun Kim, Yeong-Bae Ahn, JongKuk Kim, SeokKyun Kim, DongHeok Park, Young-Sik Kim

Proceedings Volume 6154, 615441 (2006) https://doi.org/10.1117/12.659398

KEYWORDS: Optical lithography, Photoresist processing, Photoresist materials, Semiconducting wafers, Lithography, Etching, Cadmium sulfide, Oxides, Lithographic illumination, Scanning electron microscopy

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Proceedings Article | 12 May 2005 Paper

Implementation of KrF 0.29 k1 lithography

Hyeong Soo Kim, Seok Kyun Kim, Young Sik Kim, Sang Man Bae, Dong Heok Park, Young Deuk Kim, Yoon Suk Hyun, Hyoung Reun Kim, Keun Kyu Kong, Min Seok Son, Yong Soon Jung, Bong Ho Choi

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598610

KEYWORDS: Lithography, Photomasks, Optical lithography, Quartz, Optical proximity correction, Device simulation, Lithographic illumination, Manufacturing, Scanners, Photography

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Proceedings Article | 12 May 2005 Paper

Implementation of contact hole patterning performance with KrF resist flow process for 80nm DRAM application

Hyoung-ryeun Kim, DongHeok Park, HyeongSoo Kim

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600254

KEYWORDS: Optical lithography, Photoresist processing, Photoresist materials, Semiconducting wafers, Lithography, 193nm lithography, Cadmium, Etching, Semiconductors, Oxides

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Proceedings Article | 30 July 2002 Paper

Limitation of optical lithography for various resolution enhancement technologies

Tae-Seung Eom, Chang-Nam Ahn, Dong-Heok Park, Cha-Won Koh, Cheol-Kyu Bok

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474545

KEYWORDS: Lithographic illumination, Optical lithography, Diffusion, Lithography, Photomasks, Resolution enhancement technologies, Electroluminescence, Optical proximity correction, Critical dimension metrology, Image processing

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Showing 5 of 7 publications

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