Dr. Dong-Heok Park
at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 10 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Multilayers, Optical lithography, Etching, Interfaces, Silicon, Reflectivity, Control systems, Double patterning technology, Immersion lithography

Proceedings Article | 26 March 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Carbon, Lithography, Polarization, Etching, Polymers, Reflectivity, Photoresist materials, Process control, Immersion lithography, System on a chip

Proceedings Article | 26 March 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Semiconductors, Lithography, Refractive index, Etching, Polymers, Materials processing, Reflectivity, Photoresist materials, Photoresist processing, Photorefractive polymers

Proceedings Article | 21 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Oxides, Lithography, Optical lithography, Lithographic illumination, Etching, Scanning electron microscopy, Photoresist materials, Cadmium sulfide, Photoresist processing, Semiconducting wafers

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Semiconductors, Oxides, Lithography, Optical lithography, Cadmium, Etching, Photoresist materials, Photoresist processing, Semiconducting wafers, 193nm lithography

Showing 5 of 7 publications
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