Dong-Seok Nam
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Etching, Chromium, Plasma, Photomasks, Plasma etching, Oxygen, Chlorine, Dry etching, Emission spectroscopy, Mask making

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Optical proximity correction, Photomasks, Semiconducting wafers, Lithography, Image processing, Line edge roughness, Edge roughness, Electron beam lithography, Critical dimension metrology, Vestigial sideband modulation

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Photomasks, Etching, Image processing, Error analysis, Image registration, Electrons, Electron beam lithography, Lithography, Finite element methods, Critical dimension metrology

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Etching, Critical dimension metrology, Chromium, Photomasks, Curium, Ions, Electron beams, Plasma etching, Photoresist processing, Information operations

Proceedings Article | 15 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Mask making, Photomasks, Electron beam lithography, Monte Carlo methods, Control systems, Optical proximity correction, Electron beams, Laser scattering, Scattering, Backscatter

Showing 5 of 26 publications
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