DongSub Choi
at KLA Korea
SPIE Involvement:
Author
Publications (36)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Overlay metrology, Optical parametric oscillators, Standards development, Manufacturing, Integrated circuits

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Optimization (mathematics), Metrology, Semiconducting wafers, Statistical methods, Statistical analysis, Time metrology, Overlay metrology, Diffractive optical elements

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Detection and tracking algorithms, Semiconducting wafers, Overlay metrology, Scanning electron microscopy, Optical parametric oscillators, Data modeling, Machine learning, Optical testing, Feature extraction, Metrology

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Overlay metrology, Optical filters, Optical parametric oscillators, 3D metrology, Semiconducting wafers, Near infrared, Photoresist materials, Imaging metrology, Wafer-level optics

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Scatterometry, Wafer-level optics, Manufacturing, Quality measurement, Imaging systems, Scanning electron microscopy, Diffractive optical elements

Showing 5 of 36 publications
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