Mr. Donggi Lee Profile

Donggi Lee

at Hanyang Univ

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Author

Publications (8)

Proceedings Article | 22 November 2023 Poster

Fizeau interferometry for evaluating EUV attenuated phase shift mask

Donggi Lee, Seungchan Moon, Jin Hyuk Choi, Seok Ho Song, Jinho Ahn

Proceedings Volume PC12750, PC127500S (2023) https://doi.org/10.1117/12.2687429

KEYWORDS: Phase shifts, Extreme ultraviolet, Refractive index, Interferometers, EUV optics, Ruthenium, Flat optics, Thin films, Film thickness, Optical coherence

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Proceedings Article | 21 November 2023 Poster + Paper

Experimental investigation of the mask diffraction light blocking with critical-sized Sn particles on the EUV pellicle

Seungchan Moon, Dong Gi Lee, Jinhyuk Choi, Junho Hong, Jinho Ahn

Proceedings Volume 12750, 127500Z (2023) https://doi.org/10.1117/12.2687444

KEYWORDS: Diffraction, Particles, Pellicles, Tin, Extreme ultraviolet, Deformation, Image restoration, Extreme ultraviolet lithography, Lithography, Imaging systems

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Proceedings Article | 21 November 2023 Presentation + Paper

Molybdenum carbide pellicle for high-power EUV lithography

Yongkyung Kim, Kihun Seong, Jonghyuk Yoon, Donggi Lee, Seungchan Moon, Sung Kyu Jang, Hyun-Mi Kim, Seul-Gi Kim, Jinho Ahn, Hyeongkeun Kim

Proceedings Volume 12750, 127500L (2023) https://doi.org/10.1117/12.2686314

KEYWORDS: Extreme ultraviolet lithography, Pellicles, Extreme ultraviolet, Plasma, Molybdenum, Transmittance, Hydrogen, High volume manufacturing, Semiconducting wafers, Scattering

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Proceedings Article | 14 April 2023 Poster

Effect of pellicle wrinkles on EUV reflectivity and local critical dimension

Seungchan Moon, Dong gi Lee, Jinhyuk Choi, Jinho Ahn

Proceedings Volume PC12494, PC124940F (2023) https://doi.org/10.1117/12.2655991

KEYWORDS: Extreme ultraviolet, Pellicles, Reflectivity, Critical dimension metrology, Diffraction, Spatial frequencies, Scanners, Reconstruction algorithms, Optical properties, Microscopes

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Proceedings Article | 11 November 2022 Presentation

Feasibility of nanometer-thickness molybdenum carbide film for extreme ultraviolet lithography pellicle

Yongkyung Kim, Kihun Seong, Donggi Lee, Seungchan Moon, Hyun-Mi Kim, Hyeongkeun Kim, Seul-Gi Kim, Jinho Ahn

Proceedings Volume PC12292, PC122920H (2022) https://doi.org/10.1117/12.2643003

KEYWORDS: Pellicles, Extreme ultraviolet lithography, Extreme ultraviolet, Molybdenum, Hydrogen, Transmittance, Photomasks, Scattering, Scanners, Plasma

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Proceedings Article | 11 November 2022 Presentation

Experimental demonstration for the influence of EUV pellicle wrinkles on the mask 3D effects

Dong gi Lee, Young Woong Kim, Seungchan Moon, Jinhyuk Choi, Seong Ju Wi, Jinho Ahn

Proceedings Volume PC12292, PC122920I (2022) https://doi.org/10.1117/12.2641801

KEYWORDS: Photomasks, Pellicles, Extreme ultraviolet, Diffraction, Reconstruction algorithms, Phase retrieval, Microscopes, Lithographic illumination, Inspection, Image retrieval

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Proceedings Article | 28 September 2021 Poster + Presentation

Effect of wrinkles on pellicle reflectivity and local critical dimension

Dong gi Lee, Young Woong Kim, Seungchan Moon, Jinho Ahn

Proceedings Volume 11854, 118541H (2021) https://doi.org/10.1117/12.2600988

KEYWORDS: Reflectivity, Pellicles, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Microscopes, Diffraction, Image restoration, High volume manufacturing

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Proceedings Article | 22 February 2021 Poster + Presentation

Actinic mask imaging using EUV ptychography microscope

Young Woong Kim, Byungmin Yoo, Dong Gi Lee, Chang Mo Ku, Joong Hwee Cho, Jinho Ahn

Proceedings Volume 11609, 116091Y (2021) https://doi.org/10.1117/12.2587895

KEYWORDS: Photomasks, Extreme ultraviolet, Microscopes, Reconstruction algorithms, Phase retrieval, Phase measurement, Image quality, Semiconductors, Semiconductor manufacturing, Phase shifts

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Showing 5 of 8 publications

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