Dr. Donggun Lee
Sr. Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 16 October 2017 Presentation
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Scanners, Inspection, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing

Proceedings Article | 28 March 2017 Presentation + Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Mirrors, Metrology, Imaging systems, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, SRAF, High volume manufacturing, Semiconducting wafers, Binary data, Airborne remote sensing, EUV optics, Lead

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Reticles, Logic, Scanners, Manufacturing, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical elements

Proceedings Article | 28 July 2014 Paper
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Lithography, Speckle, Scattering, Inspection, Atomic force microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Line edge roughness, Scatter measurement

Proceedings Article | 27 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Data modeling, Etching, Silicon, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Critical dimension metrology, Ruthenium, EUV optics

Showing 5 of 12 publications
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