Dr. Dongbing Shao Profile

Dr. Dongbing Shao

at IBM Corp

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Author

Publications (9)

Proceedings Article | 20 March 2019 Paper

Incorporating process variation contours in design rule calculation and SRAM design optimization

Dongbing Shao, Jing Sha, Jinning Liu, Robert Wong

Proceedings Volume 10962, 109620Y (2019) https://doi.org/10.1117/12.2515636

KEYWORDS: Semiconducting wafers, Monte Carlo methods, Design for manufacturing, Optical lithography, Semiconductor manufacturing

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Proceedings Article | 4 April 2017 Presentation + Paper

Identification and sensitivity analysis of a correlated ground rule system (design arc)

Eric Eastman, Dureseti Chidambarrao, Werner Rausch, Rasit Topaloglu, Dongbing Shao, Ravikumar Ramachandran, Matthew Angyal

Proceedings Volume 10148, 101480I (2017) https://doi.org/10.1117/12.2258002

KEYWORDS: Monte Carlo methods, Computer simulations, Tolerancing, 3D modeling, Lithography, Semiconductors, Logic, Performance modeling, Process engineering, Data modeling, Manufacturing, Design for manufacturability, Detection and tracking algorithms, Statistical modeling, Systems modeling

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Proceedings Article | 16 March 2016 Paper

Integrated layout based Monte-Carlo simulation for design arc optimization

Dongbing Shao, Larry Clevenger, Lei Zhuang, Lars Liebmann, Robert Wong, James Culp

Proceedings Volume 9781, 978106 (2016) https://doi.org/10.1117/12.2218636

KEYWORDS: Monte Carlo methods, Semiconducting wafers, Design for manufacturability, Manufacturing, Semiconductors, Diffractive optical elements, Microelectronics, Protactinium, Process modeling

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Proceedings Article | 9 September 2013 Paper

Under-layer effects for block levels: are they under control?

Dongbing Shao, Bidan Zhang, Shayak Banerjee, Hong Kry, Anuja De Silva, Ranee Kwong, Kisup Chung, Yea-Sen Lin, Alan Leslie

Proceedings Volume 8880, 88802L (2013) https://doi.org/10.1117/12.2029356

KEYWORDS: Critical dimension metrology, Silicon, Etching, Semiconducting wafers, Optical proximity correction, Reflectivity, Near field optics, Computational lithography, Optical lithography, Data modeling

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Proceedings Article | 23 March 2011 Paper

3D lithography modeling for ground rule development

Chandra Sarma, Todd Bailey, Adam Lyons, Dongbing Shao

Proceedings Volume 7973, 797315 (2011) https://doi.org/10.1117/12.879213

KEYWORDS: 3D modeling, Semiconducting wafers, Photoresist processing, Critical dimension metrology, Silicon, Photovoltaics, Lithography, Data modeling, Visualization, Metrology

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Proceedings Article | 25 September 2010 Paper

Substrate aware OPC rules for edge effect in block levels

Dongbing Shao, Todd Bailey, Ian Stobert, Irene Popova, Chan Sam Chang

Proceedings Volume 7823, 78233U (2010) https://doi.org/10.1117/12.865134

KEYWORDS: Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Silicon, Data modeling, Photomasks, Calibration, Printing, Reflectivity, Photoresist processing

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Proceedings Article | 25 September 2010 Paper

Physical resist model calibration for implant level using laser-written photomasks

Dongbing Shao, Bidan Zhang, Sajan Marokkey, Todd Bailey, Derren Dunn, Emily Gallagher, Yea-Sen Lin, Takashi Murakami, Seiji Nakagawa, Chandrasekhar Sarma, Mohamed Talbi

Proceedings Volume 7823, 78230U (2010) https://doi.org/10.1117/12.865131

KEYWORDS: Photomasks, Data modeling, Calibration, 3D modeling, Semiconducting wafers, Scanning electron microscopy, Optical proximity correction, Photoresist processing, Process modeling, Silicon

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Proceedings Article | 13 March 2010 Paper

Three-dimensional physical photoresist model calibration and profile-based pattern verification

Mohamed Talbi, Amr Abdo, Todd Bailey, Will Conley, Derren Dunn, Masashi Fujimoto, John Nickel, No Young Chung, Sajan Marokkey, Si Hyeung Lee, Chandrasekhar Sarma, Dongbing Shao, Ramya Viswanathan

Proceedings Volume 7640, 76401D (2010) https://doi.org/10.1117/12.846466

KEYWORDS: 3D modeling, Photoresist materials, Data modeling, Calibration, Scanning electron microscopy, Critical dimension metrology, Photomasks, 3D image processing, Statistical modeling, Optical lithography

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Proceedings Article | 23 February 2006 Paper

Laser-nanostructure interactions and applications for parallel nanomanufacturing

Arvind Battula, Dongbing Shao, Yi Lu, Shaochen Chen

Proceedings Volume 6107, 61070F (2006) https://doi.org/10.1117/12.648735

KEYWORDS: Optical spheres, Near field optics, Photomasks, Silicon carbide, Glasses, Scanning electron microscopy, Near field, Nanostructures, Titanium, Optical lithography

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Showing 5 of 9 publications

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