Mr. Dongjin Lee Profile

Dongjin Lee

at SK Hynix Inc

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 20 March 2020 Paper

Improving after-etch overlay performance using high-density in-device metrology in DRAM manufacturing

Ik-Hyun Jeong, Seung-Woo Koo, Hyun-Sok Kim, Jung-Il Hwang, Dong-Jin Lee, Min-Shik Kim, Jae-Wuk Ju, Kang-Min Lee, Young-Sik Kim, Cees Lambregts, Rizvi Rahman, Marc Hauptmann, Raheleh Pishkari, Allwyn Boustheen, Kwang-Young Hu, Paul Böcker, Dong-Hak Lee, In-Ho Joo, Kang-San Lee

Proceedings Volume 11325, 113252X (2020) https://doi.org/10.1117/12.2552028

KEYWORDS: Overlay metrology, Etching, Inspection, Semiconducting wafers, Metrology, Feedback loops, Scanners, Spatial frequencies, High volume manufacturing

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Proceedings Article | 20 March 2020 Presentation + Paper

Optical overlay measurement accuracy improvement with machine learning

Alexander Verner, Hyunsok Kim, Ikhyun Jeong, Seungwoo Koo, Dongjin Lee, Honggoo Lee, Boaz Ophir, Ohad Bachar, Liran Yerushalmi, Sanghuck Jeon, Dongsub Choi, Jeongpyo Lee

Proceedings Volume 11325, 113251Z (2020) https://doi.org/10.1117/12.2551850

KEYWORDS: Detection and tracking algorithms, Semiconducting wafers, Overlay metrology, Scanning electron microscopy, Optical parametric oscillators, Data modeling, Machine learning, Optical testing, Feature extraction, Metrology

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Proceedings Article | 16 March 2009 Paper

Novel OPC method to create sub 45nm contact hole using design based metrology

Dong-Jin Lee, Se-young Oh, Jong-cheon Park, Jin-young Choi, Jungchan Kim, Cheolkyun Kim, Donggyu Yim

Proceedings Volume 7274, 72742C (2009) https://doi.org/10.1117/12.814386

KEYWORDS: Optical proximity correction, Critical dimension metrology, Metrology, Printing, Overlay metrology, Data modeling, Photomasks, Semiconductors, Systems modeling

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Proceedings Article | 26 March 2007 Paper

Application of full-chip optical proximity correction for sub-60-nm memory device in polarized illumination

Hyoung-Soon Yune, Yeong-Bae Ahn, Dong-jin Lee, James Moon, Byung-Ho Nam, Dong-gyu Yim

Proceedings Volume 6520, 65201R (2007) https://doi.org/10.1117/12.711977

KEYWORDS: Optical proximity correction, Polarization, Calibration, Critical dimension metrology, Data modeling, Lithographic illumination, Resolution enhancement technologies, Lithography, Semiconducting wafers, Line edge roughness

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Proceedings Article | 20 May 2006 Paper

Lithography process margin enhancement using illumination based assist pattern

James Moon, Dong-Jin Lee, Gui-Hwang Sim, Jae-Doo Eum, Byung-Ho Nam, Dong Gyu Yim

Proceedings Volume 6283, 62832X (2006) https://doi.org/10.1117/12.681814

KEYWORDS: Lithography, Lithographic illumination, Photomasks, Safety, Inspection, Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Error analysis

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Proceedings Article | 24 May 2004 Paper

Belly button reduction using optimized resist filtration method in CMOS gate pattern process

Jeong-Heon Baik, Dong-Jin Lee, Sung-Ho Lee, Sun-Hyung Park, Il-Ho Lee, Jae-Sung Choi

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.533895

KEYWORDS: Etching, Semiconducting wafers, Coating, Photoresist processing, Transistors, Particles, Inspection, Failure analysis, Critical dimension metrology, Reflectivity

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Showing 5 of 6 publications

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