Dong-Seok Nam
at ASML US
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Optical design, Etching, Manufacturing, Reflectivity, Printing, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Ruthenium, Absorption

Proceedings Article | 16 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Microscopes, Light sources, Reticles, Optical lithography, Scanners, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Fiber optic illuminators

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Metrology, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Stochastic processes

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