Dr. Dongyue Yang Profile

Dr. Dongyue Yang

Sr. Process Eng at GLOBALFOUNDRIES Inc

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Publications (3)

Proceedings Article | 23 March 2020 Presentation + Paper

Accuracy improvement in advance lithography focus control

Dongyue Yang, Cassidy Dineen, Xueli Hao, Young Ki Kim, Poya Hsu, Chris Hsu, Bradley Morgenfeld

Proceedings Volume 11327, 113270O (2020) https://doi.org/10.1117/12.2551904

KEYWORDS: Semiconducting wafers, Lithography, Critical dimension metrology, Diffraction, Scanners, Yield improvement, High volume manufacturing, Metrology, Wafer-level optics, Process control

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Proceedings Article | 26 March 2019 Presentation + Paper

Process drift compensation by tunable wavelength homing in scatterometry-based overlay

Kun Gao, Nir BenDavid, Chen Dror, Hao Mei, Weihua Li, Xindong Gao, Linfei Gao, Xueli Hao, Tony Joung, DeNeil Park, Yue Zhou, Pedro Herrera, Vidya Ramanathan, Victoria Naipak, Meng Wang, Renan Milo, Tal Yaziv, Md. Motasim Bellah, Karsten Gutjahr, Dongyue Yang, Cheuk Wun Wong, Abhishek Gottipati

Proceedings Volume 10959, 1095906 (2019) https://doi.org/10.1117/12.2514548

KEYWORDS: Overlay metrology, Scatterometry, Process control

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Proceedings Article | 26 March 2019 Paper

Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis

Pedro Herrera, Kun Gao, Vidya Ramanathan, Chen Dror, Victoria Naipak, Renan Milo, Nir BenDavid, Meng Wang, Hao Mei, Weihua Li, Xindong Gao, Dongyue Yang, Cheuk Wun Wong, Karsten Gutjahr, Xueli Hao, Tony Joung, Md. Motasim Bellah, DeNeil Park, Abhishek Gottipati, Yue Zhou, Tal Yaziv, Eitan Hajaj, Raviv Yohanan, Alon Alexander Volfman

Proceedings Volume 10959, 1095928 (2019) https://doi.org/10.1117/12.2514725

KEYWORDS: Overlay metrology, Metrology, Process control, Semiconducting wafers, Inspection, Optical filters, Polarization, Modeling and simulation, Scatterometry

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