Dr. Donna M. Lennon Profile

Dr. Donna M. Lennon

at MIT Lincoln Lab

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Author

Publications (7)

Proceedings Article | 18 February 2009 Paper

High speed analog-to-digital conversion with silicon photonics

C. Holzwarth, R. Amatya, M. Araghchini, J. Birge, H. Byun, J. Chen, M. Dahlem, N. DiLello, F. Gan, J. Hoyt, E. Ippen, F. Kärtner, A. Khilo, J. Kim, M. Kim, A. Motamedi, J. Orcutt, M. Park, M. Perrott, M. Popovic, R. Ram, H. Smith, G. Zhou, S. Spector, T. Lyszczarz, M. Geis, D. Lennon, J. Yoon, M. Grein, R. Schulein, S. Frolov, A. Hanjani, J. Shmulovich

Proceedings Volume 7220, 72200B (2009) https://doi.org/10.1117/12.808952

KEYWORDS: Silicon, Waveguides, Modulators, Diodes, Electronics, Germanium, Photodiodes, Femtosecond phenomena, Optical filters, Mode locking

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Proceedings Article | 13 February 2008 Paper

Photonic analog-to-digital conversion with electronic-photonic integrated circuits

F. Kärtner, R. Amatya, M. Araghchini, J. Birge, H. Byun, J. Chen, M. Dahlem, N. DiLello, F. Gan, C. Holzwarth, J. Hoyt, E. Ippen, A. Khilo, J. Kim, M. Kim, A. Motamedi, J. Orcutt, M. Park, M. Perrott, M. Popović, R. Ram, H. Smith, G. Zhou, S. Spector, T. Lyszczarz, M. Geis, D. Lennon, J. Yoon, M. Grein, R. Schulein

Proceedings Volume 6898, 689806 (2008) https://doi.org/10.1117/12.767926

KEYWORDS: Silicon, Modulators, Waveguides, Optical filters, Diodes, Germanium, Electronics, Photodetectors, Phase shifts, Photodiodes

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Proceedings Article | 23 March 2007 Paper

Hybrid optical: electron-beam resists

D. Lennon, S. Spector, T. Fedynyshyn, T. Lyszczarz, M. Rothschild, J. Thackeray, K. Spear-Alfonso

Proceedings Volume 6519, 65190H (2007) https://doi.org/10.1117/12.714370

KEYWORDS: Semiconducting wafers, Wafer-level optics, Electron beam lithography, Polymethylmethacrylate, Hybrid optics, Photoresist processing, Lithography, Chemically amplified resists, Head-mounted displays, Photoresist materials

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Proceedings Article | 14 February 2007 Paper

Integrated optical components in silicon for high speed analog-to-digital conversion

S. Spector, T. Lyszczarz, M. Geis, D. Lennon, J. Yoon, M. Grein, R. Schulein, R. Amatya, J. Birge, J. Chen, H. Byun, F. Gan, C. Holzwarth, J. Hoyt, E. Ippen, F. Kärtner, A. Khilo, O. Olubuyide, J. Orcutt, M. Park, M. Perrott, M. Popović, T. Barwicz, M. Dahlem, R. Ram, H. Smith

Proceedings Volume 6477, 64770O (2007) https://doi.org/10.1117/12.705219

KEYWORDS: Silicon, Optical filters, Diodes, Modulators, Waveguides, Electronics, Modulation, Femtosecond phenomena, Resonators, Photodiodes

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Proceedings Article | 24 July 2002 Paper

Modeling of acid catalyzed resists with electron beam exposure

Theodore Fedynyshyn, Jason Gillman, Russell Goodman, Theodore Lyszczarz, Steven Spector, Donna Lennon, Sandy Denault, Robert Bates

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474190

KEYWORDS: Electron beams, Semiconducting wafers, Optical simulations, Mask making, Silicon, Electron beam lithography, 3D modeling, Lithography, Optical proximity correction, Diffusion

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Proceedings Article | 30 December 1999 Paper

Comparison of DNQ/novolac resists for e-beam exposure

Theodore Fedynyshyn, Scott Doran, Michele Lind, Theodore Lyszczarz, William DiNatale, Donna Lennon, Charles Sauer, Jeff Meute

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373357

KEYWORDS: Performance modeling, Photoresist processing, Mask making, Electron beam lithography, Lithography, Photomasks, Optical simulations, Monte Carlo methods, Statistical analysis, Electron beams

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Proceedings Article | 11 June 1999 Paper

Screening of DNQ/novolac resists with e-beam exposure

Theodore Fedynyshyn, Scott Doran, Michele Lind, Theodore Lyszczarz, William DiNatale, Donna Lennon, Charles Sauer, Jeff Meute

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350180

KEYWORDS: Mask making, Scanning electron microscopy, Electron beam lithography, Performance modeling, Lithography, Photomasks, Photoresist processing, Electron beams, Quartz, Monte Carlo methods

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Showing 5 of 7 publications

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