Dr. Douglas P. Hansen Profile

Dr. Douglas P. Hansen

Chief Technical Officer/General Manager at MOXTEK Inc

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Publications (4)

Proceedings Article | 7 July 1997 Paper

Unique approach to high-performance magnification calibration

Douglas Hansen, Michael Lines, Donald Chernoff, Jason Lohr

Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275933

KEYWORDS: Calibration, Scanning electron microscopy, Standards development, Microscopes, Physics, Atomic force microscopy, Statistical analysis, Scanning probe microscopy, Electron microscopes, Silicon

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Dimensional calibration standards are an important metrology tool for quality control, inspection, and fault analysis. Tools such as atomic force microscopes (AFM), scanning probe microscopes (SPM), or scanning electron microscopes (SEM) require regular calibration to meet the needs of current and projected production processes. Suitable calibration standards have been expensive, difficult to use, and of limited utility. These limitations were, to a large degree, a result of the fabrication process and the accompanying measurement calibration paradigm. Any approach to microscope calibration should make calibration easier, less expensive, and more useful. An improved calibration standard would also be amenable to automation of the calibration process for use in production line instruments. The necessary features include: (1) the ability to calibrate the entire viewing field instead of discrete points; (2) the ability to easily locate and use the calibrated region; (3) the ability to calibrate on the nanometer scale where the most demanding applications push the state of the art; (4) significantly reduced specimen costs. There is an alternative production method for calibration specimens which meets the above criteria. It is based on the concept of physically replicating a light interference pattern to provide the essence of an interferometer in a simple calibration specimen. Modern optics technology has reached the point where large area, very accurate nd regular interference patterns in 1 and 2 dimensions can be produced. The basic physics of the process enables the periodicity of these patterns to be specified and controlled to fractions of a nanometer over these very large areas. This large-area interference pattern can be captured in a physical record suitable for viewing under the microscope. The issues affecting the accuracy and utility of this physical record and its preparation for use as a magnification standard will be discussed. Experience in sue in AFM applications indicates that calibration samples produced by this method can deliver repeatable accuracy of 1.5 nm if properly employed and analyzed. This methodology can be extended to other imaging microscope technologies.

Proceedings Article | 7 July 1997 Paper

High-precision calibration of a scanning probe microscope (SPM) for pitch and overlay measurements

Donald Chernoff, Jason Lohr, Douglas Hansen, Michael Lines

Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275913

KEYWORDS: Calibration, Scanning probe microscopy, Magnetism, Integrated circuits, Overlay metrology, Metrology, Optical discs, Digital video discs, Holography, Image registration

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Proceedings Article | 11 November 1994 Paper

Plane multilayer amplitude gratings fabrication and measurement: recent results

Douglas Hansen, Hans Pew, David Allred, John Colton, Gary Stradling, John Gunther, Serban Porumbescu

Proceedings Volume 2279, (1994) https://doi.org/10.1117/12.193174

KEYWORDS: Reflectivity, X-rays, Diffraction gratings, Sensors, Spectral resolution, Monochromators, Polarization, X-ray detectors, X-ray telescopes, Ultraviolet radiation

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Proceedings Article | 21 January 1993 Paper

Multilayer phase-diffraction gratings modeled as a structure in three dimensions

Douglas Hansen, Arturo Reyes-Mena, John Colton, Larry Knight, David Allred

Proceedings Volume 1742, (1993) https://doi.org/10.1117/12.140581

KEYWORDS: Diffraction gratings, Interfaces, Diffraction, 3D modeling, Optical design, Multilayers, Reflection, X-ray diffraction, Wavefronts, Lithography

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