Dr. Douglas Holmgren Profile

Dr. Douglas Holmgren

Senior Member/Technical Staff at Applied Materials Inc

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Publications (1)

Proceedings Article | 15 October 2003 Paper

A raster multibeam lithography tool for sub-100-nm mask fabrication utilizing a novel photocathode

Juan Maldonado, Steven Coyle, Bassam Shamoun, Ming Yu, Timothy Thomas, Douglas Holmgren, Xiaolan Chen, B. DeVore, M. Scheinfein, Mark Gesley

Proc. SPIE. 5220, Nanofabrication Technologies

KEYWORDS: Photomasks, Lithography, Raster graphics, Electron beam lithography, Mask making, Modulation, Prototyping, Electron beams, Semiconducting wafers, Laser applications

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