Dr. Douglas J. Resnick
VP Marketing and Business Development at Canon Nanotechnologies Inc
SPIE Involvement:
Conference Program Committee | Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Author | Editor | Instructor
Publications (91)

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Semiconductors, Lithography, Optical lithography, Particles, Manufacturing, Photomasks, Line width roughness, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Semiconductors, Lithography, Optical lithography, Particles, Manufacturing, Photomasks, Line width roughness, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 3 October 2018 Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Nanotechnology, Lithography, Optical lithography, Etching, Dry etching, Photomasks, Extreme ultraviolet lithography, Deposition processes, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 16 October 2017 Paper
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Lithography, Optical lithography, Ultraviolet radiation, Manufacturing, Photomasks, Nanoimprint lithography, Semiconducting wafers, Chemical mechanical planarization

Proceedings Article | 27 March 2017 Paper
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Oxides, Lithography, Multilayers, Silica, Etching, Chromium, Scanning electron microscopy, Atomic layer deposition, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, System on a chip, Plasma

Showing 5 of 91 publications
Proceedings Volume Editor (5)

SPIE Conference Volume | 21 April 2015

SPIE Conference Volume | 30 April 2014

SPIE Conference Volume | 11 April 2013

SPIE Conference Volume | 18 April 2012

Conference Committee Involvement (25)
Photomask Technology
26 September 2021 | Monterey, California, United States
Novel Patterning Technologies 2021
22 February 2021 | Online Only, California, United States
Photomask Technology
21 September 2020 | Online Only, California, United States
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
24 February 2020 | San Jose, California, United States
Photomask Technology
16 September 2019 | Monterey, California, United States
Showing 5 of 25 Conference Committees
Course Instructor
SC622: Nano-Scale Patterning with Imprint Lithography
This course will start by discussing the basics of nanoimprint lithography including a discussion of the various kinds of imprint lithography. It will cover advantages and challenges of using imprint lithography for sub-100 nm and sub-50 nm patterning. The course will focus on step and repeat UV nanoimprint lithography tools and processes. Specific topics addressed will include: tool design and performance, process resolution limits, CD control, etch requirements, overlay alignment, process defects, materials development, and 1X mask infrastructure. Potential applications of the technology will also be discussed.
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