Mr. Eui-Sang Park Profile

Eui-Sang Park

at SK Hynix Inc

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Author

Publications (6)

Proceedings Article | 10 April 2024 Poster + Paper

Wafer printability simulation of EUV mask defects using mask SEM and AFM

Donghwan Son, Lanpo He, Masaki Satake, Ying He, Kihun Park, Suhwan Kim, Jing Jiao, Peter Hu, Vikram Tolani, Kangjoon Seo, Kiwoo Jun, Heeyeon Jang, Sujeong Won, Bonseung Koo, Yongwook Lee, Sungha Woo, Euisang Park

Proceedings Volume 12955, 129552N (2024) https://doi.org/10.1117/12.3010196

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Printing, Extreme ultraviolet, Atomic force microscopy, Contour extraction, Binary data, Data processing, Scanners, Extreme ultraviolet lithography

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Proceedings Article | 9 July 2015 Paper

The method of quartz damage recovery in the photomask repair process

Hoon Namkung, MunSik Kim, EuiSang Park, HoYong Jung, SangPyo Kim, DongGyu Yim

Proceedings Volume 9658, 965806 (2015) https://doi.org/10.1117/12.2193081

KEYWORDS: Quartz, Photomasks, Critical dimension metrology, Distortion, Light scattering, Silica, Particles, Surface roughness, Optical lithography, Defect detection

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Proceedings Article | 9 July 2015 Paper

The study of develop optimization to control various resist defect in Photomask fabrication

JongHoon Lim, ByungJu Kim, JaeSik Son, EuiSang Park, SangPyo Kim, DongGyu Yim

Proceedings Volume 9658, 96580Q (2015) https://doi.org/10.1117/12.2193111

KEYWORDS: Photomasks, Photoresist processing, Etching, Inspection, Electroluminescence, Control systems, Chromium, Polymers, Tolerancing, Semiconducting wafers

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Proceedings Article | 8 October 2014 Paper

The feasibility of the additional process for improving pattern collapse in develop process

Jong Hoon Lim, Jae Sik Son, Eui Sang Park, Sang Pyo Kim, Dong Gyu Yim

Proceedings Volume 9235, 92351N (2014) https://doi.org/10.1117/12.2066279

KEYWORDS: SRAF, Inspection, Photomasks, Capillaries, Photoresist processing, Particles, Etching, Defect inspection, Bridges, Optical lithography

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Proceedings Article | 8 November 2012 Paper

CD uniformity improvement through elimination of hardware influences on post-exposure bake

Jong Hoon Lim, Sung Ha Woo, Eui-Sang Park, Sang Pyo Kim, Dong Gyu Yim, Osamu Katada, Tobias Wähler, Peter Dress, Uwe Dietze

Proceedings Volume 8522, 85222L (2012) https://doi.org/10.1117/12.979470

KEYWORDS: Sensors, Mirrors, Photomasks, Photoresist processing, Temperature metrology, Manufacturing, Optimization (mathematics), Photoresist materials, Etching, Critical dimension metrology

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Proceedings Article | 27 May 2010 Paper

Compensating for image placement errors for the HP 3X nm node

Eui Sang Park, Sang Pyo Kim, Tae Joong Ha, Chang Reol Kim

Proceedings Volume 7748, 77481E (2010) https://doi.org/10.1117/12.867721

KEYWORDS: Photomasks, Double patterning technology, Error analysis, Overlay metrology, Image registration, Pellicles, Electrons, Manufacturing, Scanners, Lithography

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Showing 5 of 6 publications

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