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Ed Korczynski
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Publications (1)
Proceedings Article | 20 March 2018 Paper
Cost modeling 22nm pitch patterning approaches
Proceedings Volume 10589, 105890R (2018) https://doi.org/10.1117/12.2297454
KEYWORDS: Extreme ultraviolet, Lithography, Optical lithography, Semiconducting wafers, Extreme ultraviolet lithography, Etching, Photomasks, Manufacturing, Photoresist materials, Atomic layer deposition
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