Dr. Edita Tejnil
Distinguished Product Engineer at Siemens Industry Software Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (33)

Proceedings Article | 24 March 2017 Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Calibration, Optical proximity correction, Data modeling, Wafer-level optics, Lithography, Computational lithography, Semiconducting wafers, Process modeling, Optical calibration, 3D modeling, Photomasks, Optical properties

SPIE Journal Paper | 16 February 2016
JM3 Vol. 15 Issue 02
KEYWORDS: 3D modeling, Photomasks, Near field, Electromagnetism, Lithography, Semiconducting wafers, Scattering, Lithographic illumination, Diffraction, Critical dimension metrology

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: 3D modeling, Photomasks, Near field, Critical dimension metrology, Semiconducting wafers, Lithography, Image quality, Data transmission, Electromagnetism, Diffraction

Proceedings Article | 17 October 2014 Paper
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Photomasks, 3D modeling, Semiconducting wafers, Optical proximity correction, Data modeling, Calibration, Manufacturing, Photoresist materials, Metrology, Refractive index

SPIE Journal Paper | 2 December 2013
JM3 Vol. 13 Issue 01
KEYWORDS: Photomasks, Semiconducting wafers, 3D modeling, Optical proximity correction, Critical dimension metrology, Calibration, Photoresist materials, Computational lithography, Data modeling, Mathematical modeling

Showing 5 of 33 publications
Conference Committee Involvement (4)
Optical Lithography XXXIV
22 February 2021 | Online Only, California, United States
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | Online Only, California, United States
Optical Microlithography XXXIII
25 February 2020 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
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