Mr. Edouard A. M. L. Duriau Profile

Edouard A. M. L. Duriau

at ASML

SPIE Involvement:

Author

Publications (2)

Proceedings Article | 21 November 2023 Presentation + Paper

Validation of imaging benefits of dual monopole exposures

Timothy Brunner, Joern-Holger Franke, Vincent Truffert, Peter De Bisschop, Gijsbert Rispens, Edouard Duriau, Andre van Dijk, Cyrus Tabery, David Rio, Etienne De Poortere, Mark van de Kerkhof, Eric Hendrickx

Proceedings Volume 12750, 1275006 (2023) https://doi.org/10.1117/12.2685543

KEYWORDS: Semiconducting wafers, Stochastic processes, Nanoimprint lithography, Printing, Line width roughness, Simulations, Optical lithography, Extreme ultraviolet lithography, Scanning electron microscopy, Extreme ultraviolet

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Proceedings Article | 1 December 2022 Presentation + Paper

Image contrast metrology for EUV lithography

Timothy Brunner, Vincent Truffert, Christopher Ausschnitt, Nicola Kissoon, Edouard Duriau, Tom Jonckers, Lieve van Look, Joern-Holger Franke

Proceedings Volume 12292, 122920A (2022) https://doi.org/10.1117/12.2640647

KEYWORDS: Photoresist processing, Metrology, Stochastic processes, Extreme ultraviolet lithography, Lithographic process control

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