Dr. Edwin te Sligte Profile

Dr. Edwin te Sligte

Senior Scientist at TNO

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Author

Publications (8)

Proceedings Article | 19 March 2018 Paper

EUV mask lifetime testing using EBL2

Chien-Ching Wu, Edwin te Sligte, Herman Bekman, Arnold Storm, Michel van Putten, Maurice P.M. Limpens, Jacqueline van Veldhoven, Alex Deutz

Proceedings Volume 10583, 1058310 (2018) https://doi.org/10.1117/12.2297369

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Pellicles, Scanners, EUV optics, High volume manufacturing

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Proceedings Article | 16 October 2017 Paper

Characterization of EBL2 EUV exposure facility

Edwin te Sligte, Michel van Putten, Freek Molkenboer, Peter van der Walle, Pim Muilwijk, Norbert Koster, Jeroen Westerhout, Peter Kerkhof, Bastiaan Oostdijck, Wouter Mulckhuyse, Alex Deutz

Proceedings Volume 10450, 1045027 (2017) https://doi.org/10.1117/12.2280356

KEYWORDS: Lifetime testing equipment, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Scintillators, Pellicles, Reticles, Optical testing, EUV optics, Cameras, Photodiodes

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Proceedings Article | 28 September 2017 Paper

Latest developments on EUV reticle and pellicle research and technology at TNO

Rogier Verberk, Norbert Koster, Edwin te Sligte, Wilbert Staring

Proceedings Volume 10446, 1044603 (2017) https://doi.org/10.1117/12.2279672

KEYWORDS: Reticles, Extreme ultraviolet, Inspection, Pellicles, EUV optics, Particles, Optical coherence tomography, Photomasks, Optics manufacturing, Contamination control

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Proceedings Article | 13 July 2017 Paper

First light and results on EBL2

Norbert Koster, Edwin te Sligte, Alex Deutz, Freek Molkenboer, Pim Muilwijk, Peter van der Walle, Wouter Mulckhuyse, Bjorn Nijland, Peter Kerkhof, Michel van Putten

Proceedings Volume 10454, 104540O (2017) https://doi.org/10.1117/12.2279025

KEYWORDS: Reticles, Extreme ultraviolet lithography, EUV optics, Scintillators, Scanners, Mirrors, Statistical analysis, Ruthenium, Extreme ultraviolet, Pellicles, Metrology, Contamination control

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Proceedings Article | 24 March 2017 Paper

First light at EBL2

Norbert Koster, Edwin te Sligte, Freek Molkenboer, Alex Deutz, Peter van der Walle, Pim Muilwijk, Wouter Mulckhuyse, Bastiaan Oostdijck, Christiaan Hollemans, Björn Nijland, Peter Kerkhof, Michel van Putten, Jeroen Westerhout

Proceedings Volume 10143, 101431N (2017) https://doi.org/10.1117/12.2257997

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Pellicles, EUV optics, Contamination control, Particles, Interfaces, Reticles, Plasma, Scintillators, Mirrors, Light

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Proceedings Article | 5 October 2016 Paper

EBL2: high power EUV exposure facility

Edwin te Sligte, Norbert Koster, Freek Molkenboer, Peter van der Walle, Pim Muilwijk, Wouter Mulckhuyse, Bastiaan Oostdijck, Christiaan Hollemans, Björn Nijland, Peter Kerkhof, Michel van Putten, André Hoogstrate, Alex Deutz

Proceedings Volume 9985, 998520 (2016) https://doi.org/10.1117/12.2240921

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Pellicles, Metrology, Photomasks, Optical filters, Statistical analysis, Photodiodes, Calibration, EUV optics

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Proceedings Article | 10 May 2016 Paper

EBL2, a flexible, controlled EUV exposure and surface analysis facility

Edwin te Sligte, Norbert Koster, Freek Molkenboer, Alex Deutz

Proceedings Volume 9984, 99840R (2016) https://doi.org/10.1117/12.2240302

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Pellicles, Metrology, Photomask infrastructure, Photomasks, Statistical analysis, Electron beam lithography, Reticles, Computer aided design, Interfaces

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Proceedings Article | 8 October 2014 Paper

A new mask exposure and analysis facility

Edwin te Sligte, Norbert Koster, Alex Deutz, Wilbert Staring

Proceedings Volume 9235, 92351F (2014) https://doi.org/10.1117/12.2083713

KEYWORDS: Extreme ultraviolet lithography, Reticles, Extreme ultraviolet, Photomasks, Electron beam lithography, Pellicles, Analytical research, Scanners, Contamination control, Statistical analysis

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Showing 5 of 8 publications

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