Eleni Psara
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 4 September 2015 Paper
Proceedings Volume 9661, 96610G (2015) https://doi.org/10.1117/12.2196426
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Optical lithography, Semiconducting wafers, Logic, Etching, Error analysis, Liquid phase epitaxy, Lithography

Proceedings Article | 17 October 2014 Paper
Proceedings Volume 9231, 923108 (2014) https://doi.org/10.1117/12.2065945
KEYWORDS: Logic, Optical proximity correction, Photomasks, Extreme ultraviolet, Semiconducting wafers, Optical lithography, Calibration, Extreme ultraviolet lithography, Critical dimension metrology, Image resolution

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