Mr. Emil C. Piscani Profile

Emil C. Piscani

Sr Microfabrication Engineer at SUNY Poly SEMATECH

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Author

Publications (18)

Proceedings Article | 1 April 2009 Paper

Non-CA resists for 193 nm immersion lithography: effects of chemical structure on sensitivity

Idriss Blakey, Lan Chen, Yong-Keng Goh, Kirsten Lawrie, Ya-Mi Chuang, Emil Piscani, Paul Zimmerman, Andrew Whittaker

Proceedings Volume 7273, 72733X (2009) https://doi.org/10.1117/12.814076

KEYWORDS: Polymers, Photons, Immersion lithography, Semiconducting wafers, Absorbance, Polymer thin films, FT-IR spectroscopy, Polymethylmethacrylate, Ionizing radiation, Optical lithography

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Proceedings Article | 1 April 2009 Paper

High-index nanocomposite photoresist for 193-nm lithography

Woo Jin Bae, Makros Trikeriotis, Robert Rodriguez, Michael Zettel, Emil Piscani, Christopher Ober, Emmanuel Giannelis, Paul Zimmerman

Proceedings Volume 7273, 727326 (2009) https://doi.org/10.1117/12.814154

KEYWORDS: Nanoparticles, Photoresist materials, Refractive index, Water, Ultraviolet radiation, Nanocomposites, Lithography, Immersion lithography, Semiconducting wafers, Absorption

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Proceedings Article | 18 March 2009 Paper

EUV resist outgassing: scaling to HVM intensity

Alin Antohe, Chimaobi Mbanaso, Yu-Jen Fan, Leonid Yankulin, Rashi Garg, Petros Thomas, Gregory Denbeaux, Emil Piscani, Andrea Wuest

Proceedings Volume 7271, 727126 (2009) https://doi.org/10.1117/12.816555

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Molecules, Photoresist materials, Polymethylmethacrylate, Spectroscopy, Semiconducting wafers, Polymers, EUV optics, Photons

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Proceedings Article | 16 March 2009 Paper

High index 193 nm immersion lithography: the beginning or the end of the road

Paul Zimmerman, Bryan Rice, Emil Piscani, Vladimir Liberman

Proceedings Volume 7274, 727420 (2009) https://doi.org/10.1117/12.814381

KEYWORDS: Absorbance, Nanoparticles, Immersion lithography, Lithography, Prisms, Refractive index, Absorption, Water, Crystals, Double patterning technology

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Proceedings Article | 16 March 2009 Paper

Thin hardmask patterning stacks for the 22-nm node

Zhimin Zhu, Emil Piscani, Yubao Wang, Jan Macie, Charles Neef, Brian Smith

Proceedings Volume 7274, 72742K (2009) https://doi.org/10.1117/12.813816

KEYWORDS: Silicon, Optical lithography, Ultraviolet radiation, Silicon carbide, Lithography, Etching, Carbon, Reflectivity, Photoresist materials, Diffraction

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Proceedings Article | 15 April 2008 Paper

Development of an operational high refractive index resist for 193nm immersion lithography

Paul Zimmerman, Jeffrey Byers, Emil Piscani, Bryan Rice, Christopher Ober, Emmanuel Giannelis, Robert Rodriguez, Dongyan Wang, Andrew Whittaker, Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu

Proceedings Volume 6923, 692306 (2008) https://doi.org/10.1117/12.772871

KEYWORDS: Nanoparticles, Refractive index, Absorbance, Immersion lithography, Polymers, Lithography, Chemistry, Chlorine, Sulfur, Line edge roughness

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Proceedings Article | 1 April 2008 Paper

Continuing 193nm optical lithography for 32nm imaging and beyond

Emil Piscani, Dominic Ashworth, Jeff Byers, Chris Van Peski, Paul Zimmerman, Bryan Rice

Proceedings Volume 6924, 69242I (2008) https://doi.org/10.1117/12.775474

KEYWORDS: Prisms, Reflectivity, Photomasks, Semiconducting wafers, Imaging systems, Double patterning technology, Wafer-level optics, Remote sensing, Polarization, Optical lithography

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Proceedings Article | 1 April 2008 Paper

Reflection control in hyper-NA immersion lithography

Zhimin Zhu, Emil Piscani, Kevin Edwards, Brian Smith

Proceedings Volume 6924, 69244A (2008) https://doi.org/10.1117/12.772899

KEYWORDS: Reflectivity, Ultraviolet radiation, Reflection, Phase shifts, Critical dimension metrology, Fused deposition modeling, Lithography, Diffraction, UV optics, Diffusion

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Proceedings Article | 28 March 2008 Paper

Film quantum yields of EUV and ultra-high PAG photoresists

Elsayed Hassanein, Craig Higgins, Patrick Naulleau, Richard Matyi, Gregg Gallatin, Gregory Denbeaux, Alin Antohe, Jim Thackeray, Kathleen Spear, Charles Szmanda, Christopher Anderson, Dimitra Niakoula, Matthew Malloy, Anwar Khurshid, Cecilia Montgomery, Emil Piscani, Andrew Rudack, Jeff Byers, Andy Ma, Kim Dean, Robert Brainard

Proceedings Volume 6921, 69211I (2008) https://doi.org/10.1117/12.774099

KEYWORDS: Quantum efficiency, Extreme ultraviolet lithography, Photoresist materials, Extreme ultraviolet, X-rays, Absorbance, Photons, Coating, Reflectometry, Line edge roughness

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Proceedings Article | 24 March 2008 Paper

Characterization of CD-SEM metrology for iArF photoresist materials

Benjamin Bunday, Aaron Cordes, N. Orji, Emil Piscani, Dan Cochran, Jeff Byers, John Allgair, Bryan Rice, Yohanan Avitan, Ram Peltinov, Maayan Bar-zvi, Ofer Adan

Proceedings Volume 6922, 69221A (2008) https://doi.org/10.1117/12.774317

KEYWORDS: Photoresist materials, Lithography, Metrology, Scanning electron microscopy, Semiconducting wafers, Atomic force microscopy, Roentgenium, Critical dimension metrology, Extreme ultraviolet, Cadmium

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Proceedings Article | 27 March 2007 Paper

Demonstration of sub-45-nm features using azimuthal polarization on a 1.30NA immersion microstepper

Emil Piscani, Shane Palmer, Chris Van Peski

Proceedings Volume 6520, 652025 (2007) https://doi.org/10.1117/12.720863

KEYWORDS: Polarization, Resolution enhancement technologies, Imaging systems, Photomasks, Immersion lithography, Scanning electron microscopy, Optical proximity correction, Image resolution, Semiconducting wafers, Finite element methods

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Proceedings Article | 22 March 2007 Paper

Novel high-index resists for 193-nm immersion lithography and beyond

Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu, Andrew Whittaker, Will Conley, Emil Piscani, Georgia Rich, Alvina Williams, Paul Zimmerman

Proceedings Volume 6519, 651909 (2007) https://doi.org/10.1117/12.715108

KEYWORDS: Polymers, Refractive index, Polymerization, Immersion lithography, Molecules, Absorbance, Nitrogen, Data modeling, Water, Sulfur

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Proceedings Article | 29 March 2006 Paper

Resist process window characterization for the 45-nm node using an interferometric immersion microstepper

Anatoly Bourov, Stewart Robertson, Bruce Smith, Michael Slocum, Emil Piscani

Proceedings Volume 6153, 61530R (2006) https://doi.org/10.1117/12.657578

KEYWORDS: Modulation, Interferometry, Data modeling, Photoresist materials, Error analysis, Imaging systems, Semiconducting wafers, Image acquisition, Critical dimension metrology, Data conversion

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Proceedings Article | 20 March 2006 Paper

Experimental measurement of photoresist modulation curves

Anatoly Bourov, Stewart Robertson, Bruce Smith, Michael Slocum, Emil Piscani

Proceedings Volume 6154, 61542Z (2006) https://doi.org/10.1117/12.657608

KEYWORDS: Modulation, Photoresist materials, Data modeling, Interferometry, Error analysis, Semiconducting wafers, Calibration, Critical dimension metrology, Nonlinear optics, Image resolution

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Proceedings Article | 29 March 1996 Paper

Three-dimensional packaging of very large scale integrated optics (VLSIO) for high-complexity optical systems

Lawrence West, Charles Roberts, Emil Piscani, Madan Dubey, Kenneth Jones, George McLane

Proceedings Volume 2691, (1996) https://doi.org/10.1117/12.236921

KEYWORDS: Waveguides, Electronics, Optics manufacturing, Integrated optics, Teeth, Optical components, Logic devices, Free space, Packaging, Capacitance

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Proceedings Article | 10 January 1996 Paper

Germanium waveguide for optical interconnects in very large scale integrated optics

Madan Dubey, Richard Lareau, Melanie Cole, Kenneth Jones, Lawrence West, Charles Roberts, Emil Piscani

Proceedings Volume 2695, (1996) https://doi.org/10.1117/12.229956

KEYWORDS: Germanium, Oxides, Absorption, Oxygen, Gallium arsenide, Crystals, FT-IR spectroscopy, Gold, Temperature metrology, Transmission electron microscopy

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Proceedings Article | 10 January 1996 Paper

GHz modulators in the midinfrared using ultrahigh-confinement waveguides

Lawrence West, Charles Roberts, Emil Piscani, Madan Dubey, Kenneth Jones, George McLane

Proceedings Volume 2695, (1996) https://doi.org/10.1117/12.229959

KEYWORDS: Waveguides, Modulators, Quantum wells, Absorption, Germanium, Modulation, Gallium arsenide, Electrodes, Infrared radiation, Mid-IR

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Proceedings Article | 10 January 1996 Paper

Using very large scale integrated optics (VLSIO) to create high-complexity optoelectronic components

Lawrence West, Charles Roberts, Emil Piscani, Madan Dubey, Kenneth Jones, George McLane

Proceedings Volume 2695, (1996) https://doi.org/10.1117/12.229951

KEYWORDS: Waveguides, Integrated optics, Optics manufacturing, Electronics, Teeth, Optical components, Logic devices, Free space, Capacitance, Manufacturing

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Showing 5 of 18 publications

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