Emil Schmitt-Weaver
Principal Development Engineer at ASML Netherlands
SPIE Involvement:
Author
Area of Expertise:
Metrology , Matlab , Photolithography , Simulations
Publications (13)

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Optical alignment, Semiconducting wafers, Metrology, Overlay metrology, Performance modeling, Deconvolution, Lithography, Wafer testing, Spatial frequencies, Neodymium

Proceedings Article | 20 March 2019 Paper
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Lithographic process control, Semiconducting wafers, Optical alignment, Overlay metrology, Sensors, Distortion, Scanners, Logic, Metrology, Process control

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Data modeling, Lithography, Optical alignment, Instrument modeling, Physics, Computing systems, Nanofabrication

Proceedings Article | 28 March 2017 Presentation + Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconducting wafers, Metrology, Lithography, Overlay metrology, Analytics, Process control, Optical lithography, Semiconductors, Optical alignment, Contamination, Sensors, Neural networks, Data modeling

Proceedings Article | 25 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Process control, Overlay metrology, Process modeling, Semiconducting wafers, Metrology, Scanners, Target detection, Lithium, Optical alignment, Time metrology

Showing 5 of 13 publications
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