Dr. Eric Cotte Profile

Dr. Eric Cotte

Research & Development Engineer at GlobalFoundries

SPIE Involvement:

Author

Publications (30)

Proceedings Article | 19 March 2015 Paper

Paper

Influence of the process-induced asymmetry on the accuracy of overlay measurements

Tetyana Shapoval, Bernd Schulz, Tal Itzkovich, Sean Durran, Ronny Haupt, Agostino Cangiano, Barak Bringoltz, Matthias Ruhm, Eric Cotte, Rolf Seltmann, Tino Hertzsch, Eitan Hajaj, Carsten Hartig, Boris Efraty, Daniel Fischer

Proceedings Volume 9424, 94240B (2015) https://doi.org/10.1117/12.2085788

KEYWORDS: Optical filters, Overlay metrology, Semiconducting wafers, Data modeling, Metrology, Optical properties, Optical simulations, Signal processing, Etching, Image segmentation

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Proceedings Article | 17 October 2014 Paper

Paper

Overlay leaves litho: impact of non-litho processes on overlay and compensation

Matthias Ruhm, Bernd Schulz, Eric Cotte, Rolf Seltmann, Tino Hertzsch

Proceedings Volume 9231, 92310O (2014) https://doi.org/10.1117/12.2068206

KEYWORDS: Overlay metrology, Etching, Semiconducting wafers, Lithography, Distortion, Metrology, Photomasks, Semiconductor manufacturing, Control systems, Plasma etching

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Proceedings Article | 1 October 2013 Paper

Paper

Scanner grid recipe creation improvement for tighter overlay specifications

Eric Cotte, Hariharasudhan Kathiresan, Matthias Ruhm, Bernd Schulz, Uwe Schulze

Proceedings Volume 8886, 888608 (2013) https://doi.org/10.1117/12.2030186

KEYWORDS: Overlay metrology, Scanners, Metrology, Semiconducting wafers, Process control, Time metrology, Lithography, Manufacturing, Pollution control, Photomasks

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Proceedings Article | 2 April 2011 Paper

Paper

Multilayer reticles: advantages and challenges for 28nm chip making

Arthur Hotzel, Rolf Seltmann, Jens Busch, Eric Cotte

Proceedings Volume 7985, 798507 (2011) https://doi.org/10.1117/12.885690

KEYWORDS: Reticles, Semiconducting wafers, Scanners, Overlay metrology, Thermal effects, Manufacturing, Lithography, Wafer-level optics, Image processing, Process control

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Proceedings Article | 23 September 2009 Paper

Paper

Mask performance improvement with mapping

Clemens Utzny, Eric Cotte, Timo Wandel, Jan Hendrik Peters

Proceedings Volume 7488, 74880N (2009) https://doi.org/10.1117/12.834302

KEYWORDS: Photomasks, Critical dimension metrology, Signal to noise ratio, Principal component analysis, Process control, Image registration, Electron beam melting, Error analysis, Lithography, Tolerancing

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Proceedings Article | 7 March 2008 Paper

Paper

Modeling the work piece charging during e-beam lithography

Benjamin Alles, Eric Cotte, Bernd Simeon, Timo Wandel

Proceedings Volume 6924, 69244P (2008) https://doi.org/10.1117/12.776651

KEYWORDS: Photomasks, Quantum efficiency, Particles, Tin, Electron beams, Diffusion, Electron beam lithography, Fourier transforms, Semiconducting wafers, Instrument modeling

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Proceedings Article | 30 October 2007 Paper

Paper

Mask characterization for double patterning lithography

Karsten Bubke, Eric Cotte, Jan Hendrik Peters, Robert de Kruif, Mircea Dusa, Joerg Fochler, Brid Connolly

Proceedings Volume 6730, 67301H (2007) https://doi.org/10.1117/12.747006

KEYWORDS: Photomasks, Reticles, Critical dimension metrology, Overlay metrology, Image registration, Semiconducting wafers, Lithography, Double patterning technology, Extreme ultraviolet lithography, Metrology

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Double patterning (DPT) lithography is seen industry-wide as an intermediate solution for the 32nm node if high index immersion as well as extreme ultraviolet lithography are not ready for a timely release for production. Apart from the obvious drawbacks of additional exposure, processing steps and the resulting reduced throughput, DPT possesses a number of additional technical challenges. This relates to, e.g., exposure tool capability, the actual applied process in the wafer fab but also to mask performance and metrology. In this paper we will address the mask performance. To characterize the mask performance in an actual DPT process, conventional parameters need to be re-evaluated. Furthermore new parameters might be more suitable to describe mask capability. This refers to, e.g., reticle to reticle overlay but also to CD differences between masks of a DPT reticle set. A DPT target of reticle to reticle induced overlay of 6nm, 3σ at mask level was proposed recently for the 32nm node. The results show that this target can be met. Besides that, local CD variations and local displacement become critical. Finally, the actual mask metrology for determination of these parameters might not be trivial and needs to be set up and characterized properly. In this paper we report on the performance of two-reticle sets based on a design developed to study the impact of mask global and local placement errors on a DPT dual line process. In a first step we focus on reticle to reticle overlay. The overlay between two masks evaluated for different wafer overlay targets is compared with measurements on actual resolution structures. In a second step, mask to mask CD variations are addressed. Off-target CD differences as well as variations of CD signatures on both reticles of a set are investigated. Finally, local CD variations and local displacements are examined. To this aim, local variations of adjacent structures on the reticle are characterized. The contribution of local effects to the overall CD and registration budget is estimated.

Proceedings Article | 3 May 2007 Paper

Paper

An empirical approach adressing the transfer of mask placement errors during exposure

B. Alles, B. Simeon, E. Cotte, T. Wandel, B. Schulz, R. Seltmann

Proceedings Volume 6533, 65330U (2007) https://doi.org/10.1117/12.736958

KEYWORDS: Photomasks, Semiconducting wafers, Error analysis, Statistical analysis, Image registration, Overlay metrology, Dysprosium, Data modeling, Statistical modeling, Metals

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Proceedings Article | 4 April 2007 Paper

Paper

Meeting overlay requirements for future technology nodes with in-die overlay metrology

Bernd Schulz, Rolf Seltmann, Jens Busch, Fritjof Hempel, Eric Cotte, Benjamin Alles

Proceedings Volume 6518, 65180E (2007) https://doi.org/10.1117/12.708471

KEYWORDS: Overlay metrology, Reticles, Semiconducting wafers, Image registration, Photomasks, Data modeling, Pellicles, Scanners, Error analysis, Metrology

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Proceedings Article | 20 October 2006 Paper

Paper

Analysis of the Vistec LMS IPRO3 performance and accuracy enhancement techniques

Gunter Antesberger, Sven Knoth, Frank Laske, Jens Rudolf, Eric Cotte, Benjamin Alles, Carola Bläsing, Wolfgang Fricke, Klaus Rinn

Proceedings Volume 6349, 63491M (2006) https://doi.org/10.1117/12.686089

KEYWORDS: Error analysis, Reticles, Distortion, Calibration, Photomasks, Image registration, Statistical analysis, Ceramics, Statistical methods, Interferometers

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Proceedings Article | 19 May 2006 Paper

Paper

Pellicle-induced aberrations and apodization in hyper-NA optical lithography

Karsten Bubke, Benjamin Alles, Eric Cotte, Martin Sczyrba, Christophe Pierrat

Proceedings Volume 6283, 628318 (2006) https://doi.org/10.1117/12.681871

KEYWORDS: Pellicles, Apodization, Polarization, Photomasks, Sodium, Lithography, Monochromatic aberrations, Birefringence, Optical proximity correction, Dielectric polarization

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Proceedings Article | 15 March 2006 Paper

Paper

193-nm immersion photomask image placement in exposure tools

Eric Cotte, Benjamin Alles, Timo Wandel, Gunter Antesberger, Silvio Teuber, Manuel Vorwerk, Andreas Frangen, Frank Katzwinkel

Proceedings Volume 6154, 61541F (2006) https://doi.org/10.1117/12.656373

KEYWORDS: Photomasks, Image registration, Etching, Semiconducting wafers, Data analysis, Optical lithography, Lithography, Thermal effects, Electron beam lithography, Numerical simulations

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Proceedings Article | 8 November 2005 Paper

Paper

Determination of mask layer stress by placement metrology

Jörg Butschke, Ute Buttgereit, Eric Cotte, Günter Hess, Mathias Irmscher, Holger Seitz

Proceedings Volume 5992, 59923U (2005) https://doi.org/10.1117/12.631526

KEYWORDS: Photomasks, Tantalum, Metrology, Optical lithography, Chromium, Interferometers, Image registration, Quartz, Finite element methods, Lithography

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Proceedings Article | 28 June 2005 Paper

Paper

Study of stress birefringence for 193-nm immersion photomasks

Eric Cotte, Michael Selle, Karsten Bubke, Silvio Teuber

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617034

KEYWORDS: Birefringence, Photomasks, Reticles, Pellicles, Jones calculus, Data modeling, Jones matrices, Distortion, Wave plates, Lead

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Proceedings Article | 28 June 2005 Paper

Paper

EUV mask image placement management in writing, registration, and exposure tools

Eric Cotte, Uwe Dersch, Christian Holfeld, Uwe Mickan, Holger Seitz, Thomas Leutbecher, Gunter Hess

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617484

KEYWORDS: Photomasks, Reticles, Optical lithography, Extreme ultraviolet, Photovoltaics, Extreme ultraviolet lithography, Image registration, Tolerancing, Electron beam lithography, Image quality

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Proceedings Article | 6 December 2004 Paper

Paper

Numerical and experimental study of oxide growth on EUV mask capping layers

Eric Cotte, Christian Holfeld, Uwe Dersch, Guenther Ruhl, Jan Perlich

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569276

KEYWORDS: Reflectivity, Silicon, Oxides, Data modeling, Extreme ultraviolet, Interfaces, Performance modeling, Inspection, Silica, Photomasks

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Proceedings Article | 6 December 2004 Paper

Paper

Pellicle choice for 193-nm immersion lithography photomasks

Eric Cotte, Ruediger Haessler, Benno Utess, Gunter Antesberger, Frank Kromer, Silvio Teuber

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569280

KEYWORDS: Pellicles, Reticles, Photomasks, Image registration, Adhesives, Immersion lithography, Printing, Numerical simulations, Polymers, Performance modeling

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Proceedings Article | 2 June 2004 Paper

Paper

Hard pellicle investigation for 157-nm lithography: impact on overlay

Richard Bruls, Tammo Uitterdijk, Orlando Cicilia, Peter De Bisschop, Michael Kocsis, Andrew Grenville, Chris Van Peski, Roxann Engelstad, Jaehyuk Chang, Eric Cotte, Kaname Okada, Kazushige Ohta, Hitoshi Mishiro, Shinya Kikugawa

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568003

KEYWORDS: Pellicles, Reticles, Distortion, Lithography, Overlay metrology, Polymers, Semiconducting wafers, Fluorine, Polymer thin films, Refraction

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SPIE Journal Paper | 1 January 2004

Theoretical analysis of 157-nm hard pellicle system purification via a cyclic purge/fill process

Gregory Nellis, Amr Abdo, Roxann Engelstad, Eric Cotte

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1630313

KEYWORDS: Pellicles, Resistance, Oxygen, Nitrogen, Protactinium, Reticles, Finite element methods, Fluid dynamics, Optical lithography, Lithography

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Proceedings Article | 17 December 2003 Paper

Paper

Experimental investigation of hard pellicle purge processes

Amr Abdo, Gregory Nellis, Aya Diab, Eric Cotte, Aaron Chalekian, Roxann Engelstad, Edward Lovell, Chris Peski

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518125

KEYWORDS: Pellicles, Resistance, Reticles, Oxygen, Distortion, Mechanics, Optical lithography, Lithography, Nitrogen, Photography

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Proceedings Article | 26 June 2003 Paper

Paper

Effects of soft pellicle frame curvature and mounting process on pellicle-induced distortions in advanced photomasks

Eric Cotte, Roxann Engelstad, Edward Lovell, Daniel Tanzil, Florence Eschbach, Yulia Korobko, Minoru Fujita, Hiroaki Nakagawa

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485474

KEYWORDS: Reticles, Pellicles, Adhesives, Metrology, Sensors, Aluminum, Photomasks, Lithography, Photography, Mechanics

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Proceedings Article | 27 December 2002 Paper

Paper

Experimental and numerical studies of the response of photomask hard pellicles to acoustic excitation

Eric Cotte, Phillip Reu, Roxann Engelstad, Edward Lovell, Andrew Grenville, Chris Van Peski

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468606

KEYWORDS: Pellicles, Reticles, Acoustics, Modal analysis, Lithography, Photomasks, Adhesives, Silica, Glasses, Computing systems

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Proceedings Article | 1 August 2002 Paper

Paper

Hard pellicle study for 157-nm lithography

Emily Shu, Fu-Chang Lo, Florence Eschbach, Eric Cotte, Roxann Engelstad, Edward Lovell, Kaname Okada, Shinya Kikugawa

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477011

KEYWORDS: Pellicles, Reticles, Photomasks, Quartz, Interferometers, Refraction, Aluminum, Lithography, Glasses, Silica

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Proceedings Article | 1 August 2002 Paper

Paper

Experimental and numerical studies of the effects of materials and attachment conditions on pellicle induced distortions in advanced photomasks

Eric Cotte, Roxann Engelstad, Edward Lovell, Daniel Tanzil, Florence Eschbach, Emily Shu

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476972

KEYWORDS: Reticles, Pellicles, Temperature metrology, Photomasks, Aluminum, Adhesives, Lithography, Performance modeling, Manufacturing, Error analysis

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Proceedings Article | 1 August 2002 Paper

Paper

Pellicle-induced distortions in advanced photomasks

Minoru Fujita, Masaya Akiyama, Masahiro Kondo, Hiroaki Nakagawa, Daniel Tanzil, Florence Eschbach, Eric Cotte, Roxann Engelstad, Edward Lovell

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476974

KEYWORDS: Adhesives, Pellicles, Photomasks, Reticles, Statistical analysis, Mechanics, Sensors, Image registration, Aluminum, Numerical simulations

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Proceedings Article | 11 March 2002 Paper

Paper

Numerical and experimental studies of pellicle-induced photomask distortions

Eric Cotte, Roxann Engelstad, Edward Lovell, Yuri Shkel, Florence Eschbach, Emily Shu, Daniel Tanzil, Rebecca Calhoun

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458346

KEYWORDS: Pellicles, Reticles, Refraction, Aluminum, Photomasks, Silica, Adhesives, Lithography, Performance modeling, Temperature metrology

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Proceedings Article | 11 March 2002 Paper

Paper

Mask-related distortions of modified fused silica reticles for 157-nm lithography

Andrew Mikkelson, Amr Abdo, Eric Cotte, Jaewoong Sohn, Roxann Engelstad, Edward Lovell

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458256

KEYWORDS: Reticles, Pellicles, Electron beam lithography, Photomasks, Silica, Lithography, Device simulation, 3D modeling, Chromium, Mechanics

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Proceedings Article | 14 September 2001 Paper

Paper

Mechanical analysis of hard pellicles for 157-nm lithography

Phillip Reu, Andrew Mikkelson, Michael Schlax, Eric Cotte, Lowell Siewert, Roxann Engelstad, Edward Lovell, Giang Dao, Jun-Fei Zheng

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435651

KEYWORDS: Pellicles, Reticles, Lithography, Aluminum, Velocity measurements, Finite element methods, Silica, Optical components, Adhesives, Modal analysis

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Proceedings Article | 21 July 2000 Paper

Paper

Film stress changes during anodic bonding of NGL masks

Eric Cotte, Michael Schlax, Roxann Engelstad, Edward Lovell, Cameron Brooks

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390089

KEYWORDS: Semiconducting wafers, Photomasks, Silicon, X-rays, Wafer bonding, Chromium, Data modeling, Lithography, Mask making, Etching

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Proceedings Article | 25 June 1999 Paper

Paper

Predicting mechanical distortions in x-ray masks

Eric Cotte, Roxann Engelstad, Edward Lovell, Cameron Brooks

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351116

KEYWORDS: Photomasks, Silicon carbide, Semiconducting wafers, Silicon, X-rays, Chromium, Finite element methods, Device simulation, Data modeling, Etching

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Showing 5 of 30 publications

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