CONFERENCE PROCEEDINGS
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Eric Kwon
at KLA Corp
SPIE Involvement:
Author
Publications (2)
Proceedings Article | 3 October 2018 Paper
Improving mask yield by implementing an advanced mask blank inspection system
Gregg Inderhees, Bill Kalsbeck, Alexander Tan, Paul Chung, JiUk Hur, Eric Kwon, Min Choo, Wonil Cho, Chan-Uk Jeon, IlYong Jang, In-Yong Kang, JeongHun Seo, Suein Son
Proceedings Volume 10810, 1081017 (2018) https://doi.org/10.1117/12.2511160
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Reticles, Yield improvement, Coating, Optical lithography, Extreme ultraviolet lithography
Proceedings Article | 23 October 2015 Paper
Accurate mask registration on tilted lines for 6F2 DRAM manufacturing
K. D. Roeth, W. Choi, Y. Lee, S. Kim, D. Yim, F. Laske, M. Ferber, M. Daneshpanah, E. Kwon
Proceedings Volume 9635, 963506 (2015) https://doi.org/10.1117/12.2202818
KEYWORDS: Photomasks, Overlay metrology, Reticles, Semiconducting wafers, Metrology, Image registration, Manufacturing, Ions, Scanners, Error analysis
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