Mr. Eric H. Lu Profile

Eric H. Lu

Technical Marketing Manager

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Author

Publications (8)

Proceedings Article | 19 May 2008 Paper

Implementation of new reticle inspection technology for progressive mask defect detection strategy in wafer fabs

Cathy Liu, Alex Lu, Crystal Wang, Eric Guo, Dongsheng Fan, Lisa Yun, Steven Liu, Raj Badoni, Eric Lu

Proceedings Volume 7028, 70282D (2008) https://doi.org/10.1117/12.793087

KEYWORDS: Inspection, Reticles, Photomasks, Semiconducting wafers, SRAF, Air contamination, Defect detection, Contamination, Modulation, Image transmission

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Proceedings Article | 19 May 2008 Paper

Fast integrated die-to-die transmitted, reflected and STARlight-2 defect inspection on memory masks

Andy Lan, Jenny Hsu, Swapnajit Chakravarty, Vincent Hsu, Ellison Chen, Eric Lu, John Miller

Proceedings Volume 7028, 70281J (2008) https://doi.org/10.1117/12.793060

KEYWORDS: Inspection, Reticles, Contamination, Photomasks, Defect inspection, Air contamination, Opacity, Semiconducting wafers, Calibration, Defect detection

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Proceedings Article | 19 May 2008 Paper

Comparison of TeraStar SL1, TeraScanHR DDR, DDT and SL2 to identify an efficient mask re-qualification inspection mode for 7Xnm half pitch design node production reticles in advanced memory wafer fab

Koji Kaneko, Takanobu Kobayashi, Jinggang Zhu, Norihiko Takatsu, Paul Yu, Kosuke Ito, Toshiaki Kojima, Yoshinori Nagaoka

Proceedings Volume 7028, 70282M (2008) https://doi.org/10.1117/12.793092

KEYWORDS: Inspection, Reticles, Photomasks, Air contamination, Semiconducting wafers, Product engineering, Defect detection, Photomask technology, Crystals, Quartz

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Proceedings Article | 1 November 2007 Paper

To improve reticle re-qualification process and reduce reticle re-cleaning frequency using efficient defect classification and defect tracking

Eric Haodong Lu, Jim Wang, Raj Badoni, Ellison Chen, Weimin Ma

Proceedings Volume 6730, 67303Q (2007) https://doi.org/10.1117/12.747195

KEYWORDS: Air contamination, Reticles, Semiconducting wafers, Inspection, Remote sensing, Defect detection, Manufacturing, Lithography, Photomasks, Contamination

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Proceedings Article | 1 November 2007 Paper

Implementation of an efficient defect classification method in photomask mass production

Cathy Liu, Crystal Wang, Skin Zhang, Eric Guo, Steven Liu, Eric Haodong Lu, Dongsheng Fan, Den Wang, Weiming Ma

Proceedings Volume 6730, 67303P (2007) https://doi.org/10.1117/12.747189

KEYWORDS: Photomasks, Inspection, Reticles, Defect inspection, Logic, Crystals, Optical proximity correction, Defect detection, Lithography, Contamination

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Proceedings Article | 30 October 2007 Paper

Enhancing productivity and sensitivity in mask production via a fast integrated die-to-database T+R inspection

Eric Haodong Lu, David Wu, Ellison Chen, Raj Badoni

Proceedings Volume 6730, 673026 (2007) https://doi.org/10.1117/12.747196

KEYWORDS: Inspection, Digital breast tomosynthesis, Reticles, Contamination, Semiconducting wafers, Defect detection, Photomasks, Defect inspection, Environmental sensing, Detection and tracking algorithms

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Proceedings Article | 15 May 2007 Paper

Recipe optimization of fab mask inspection for 180~90-nm reticles to save inspection time and improve productivity

Eric Lu, Ching Yun Hsiang, Jim Wang, Jinggang Zhu, Ellison Chen, Kaustuve Bhattacharyya

Proceedings Volume 6607, 66072G (2007) https://doi.org/10.1117/12.728999

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Reticles, Lithography, Defect inspection, Contamination, Particles, 193nm lithography, Manufacturing

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Proceedings Article | 15 May 2007 Paper

Enhancing productivity and sensitivity in mask production via a fast integrated T+R pattern inspection and STARlight-2 contamination inspection on critical layers

Jean-Paul Sier, Eric Haodong Lu, Kaustuve Bhattacharyya, Swapnajit Chakravarty, Michael Lang, Heiko Schmalfuss, Jan Heumann, Thomas Schulmeyer

Proceedings Volume 6607, 66072C (2007) https://doi.org/10.1117/12.728995

KEYWORDS: Inspection, Defect detection, Contamination, Reticles, Photomasks, Defect inspection, Detection and tracking algorithms, Stars, Dysprosium, Optical properties

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Showing 5 of 8 publications

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