Eric R. Poortinga
Product Manager and Sales Representative
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Photomasks, Image analysis, Image processing, Semiconducting wafers, Error analysis, Manufacturing, Analytical research, Tolerancing, Critical dimension metrology, Standards development

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Photomasks, Image analysis, Metrology, Semiconducting wafers, Manufacturing, Error analysis, Analytical research, Critical dimension metrology, Standards development, Lithography

Proceedings Article | 1 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Metrology, Photomasks, Computer programming, Manufacturing, Interfaces, Manufacturing equipment, Databases, Visualization, Optical proximity correction, Data modeling

Proceedings Article | 25 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Photomasks, Image processing, Critical dimension metrology, Semiconducting wafers, Metrology, Design for manufacturing, Visualization, Lithography, Scanning electron microscopy, Interfaces

Proceedings Article | 3 May 2007 Paper
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Scanners, Metrology, Lithography, Data acquisition, Manufacturing, Photoresist processing, Image acquisition

Showing 5 of 13 publications
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