Dr. Erik R. Hosler
at PsiQuantum
SPIE Involvement:
Conference Program Committee | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Author
Area of Expertise:
Lithography , EUV Source , Free-electron lasers , EUV Metrology , Mask Inspection , Cost of Ownership
Publications (17)

Proceedings Article | 28 April 2020 Presentation
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

SPIE Journal Paper | 30 October 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Free electron lasers, Extreme ultraviolet lithography, Electron beams, Extreme ultraviolet, Electrons, Lithography, Monochromators, Light sources, Scanners, Optical resonators

Proceedings Article | 16 October 2017 Presentation
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, High volume manufacturing, EUV optics

Proceedings Article | 31 March 2017 Presentation + Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Electron beams, Light sources, Imaging systems, Scanners, Electrons, Manufacturing, Laser applications, Amplifiers, Optical resonators, Extreme ultraviolet, Extreme ultraviolet lithography, Monochromators, Semiconducting wafers, Free electron lasers, Plasma

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Reticles, Metrology, Imaging systems, Scanners, Error analysis, Control systems, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Systems modeling, Overlay metrology

Showing 5 of 17 publications
Conference Committee Involvement (4)
Novel Patterning Technologies 2021
22 February 2021 | Online Only, California, United States
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
24 February 2020 | San Jose, California, United States
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019
25 February 2019 | San Jose, California, United States
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
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