Mr. Eros Huang Profile

Eros Huang

at KLA Taiwan

SPIE Involvement:

Author

Publications (6)

SPIE Journal Paper | 2 December 2014 Open Access

Techniques for improving overlay accuracy by using device correlated metrology targets as reference

Wei Jhe Tzai, Simon C. Hsu, Howard Chen, Charlie Chen, Yuan Chi Pai, Chun-Chi Yu, Chia-Ching Lin, Tal Itzkovich, Lipkong Yap, Eran Amit, David Tien, Eros Huang, Kelly T. Kuo, Nuriel Amir

JM3, Vol. 13, Issue 04, 041412, (December 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041412

KEYWORDS: Metrology, Overlay metrology, Calibration, Optical filters, Etching, Semiconducting wafers, Detection and tracking algorithms, Polishing, Chemical vapor deposition, Chemical mechanical planarization

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SPIE Journal Paper | 6 October 2014 Open Access

DongSub Choi, Tal Itzkovich, Inna Tarshish-Shapir, Eros Huang, Charlie Chen, George K. Huang, Yuan Chi Pai, Jimmy C. Wu, Yu Wei Cheng, Simon C. Hsu, Chun Chi Yu, Nuriel Amir, David Tien, Kelly T. Kuo, Takeshi Kato, Osamu Inoue, Hiroki Kawada, Yutaka Okagawa, Luis Huang, Matthew Hsu, Amei Su

JM3, Vol. 13, Issue 04, 041404, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041404

KEYWORDS: Metrology, Overlay metrology, Calibration, Optical testing, Etching, Inspection, Scanning electron microscopy, Imaging metrology, Electron microscopes, Measurement devices

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Proceedings Article | 21 April 2014 Paper

Innovative techniques for improving overlay accuracy by using DCM (device correlated metrology) targets as reference

Wei-Jhe Tzai, Simon C. Hsu, Howard Chen, Charlie Chen, Yuan Chi Pai, Chun-Chi Yu, Chia Ching Lin, Tal Itzkovich, Lipkong Yap, Eran Amit, David Tien, Eros Huang, Kelly T. Kuo, Nuriel Amir

Proceedings Volume 9050, 90501R (2014) https://doi.org/10.1117/12.2046671

KEYWORDS: Metrology, Overlay metrology, Calibration, Optical filters, Etching, Semiconducting wafers, Chemical mechanical planarization, Detection and tracking algorithms, Polishing, Computer simulations

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Proceedings Article | 18 April 2013 Paper

DCM: device correlated metrology for overlay measurements

Charlie Chen, George K. Huang, Yuan Chi Pai, Jimmy C. Wu, Yu Wei Cheng, Simon C. Hsu, Chun Chi Yu, Nuriel Amir, Dongsub Choi, Tal Itzkovich, Inna Tarshish-Shapir, David Tien, Eros Huang, Kelly T. Kuo, Takeshi Kato, Osamu Inoue, Hiroki Kawada, Yutaka Okagawa, Luis Huang, Matthew Hsu, Amei Su

Proceedings Volume 8681, 86812R (2013) https://doi.org/10.1117/12.2011363

KEYWORDS: Overlay metrology, Metrology, Calibration, Optical testing, Etching, Measurement devices, Scanning electron microscopy, Inspection, Lithography, Scanners

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Proceedings Article | 5 April 2012 Paper

Multi-level overlay techniques for improving DPL overlay control

Charlie Chen, Y. Pai, Dennis Yu, Peter Pang, Chun Chi Yu, Robert (Hsing-Chien) Wu, Eros (Chien Jen) Huang, Marson (Chiun-Chieh) Chen, David Tien, Dongsub Choi

Proceedings Volume 8324, 83242A (2012) https://doi.org/10.1117/12.915711

KEYWORDS: Overlay metrology, Semiconducting wafers, Image quality, Image processing, Error analysis, Data modeling, Control systems, Current controlled current source, Quality measurement, Binary data

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Proceedings Article | 24 July 2002 Paper

Stable E-beam metrology on ArF resist for advanced process control

Chih-Ming Ke, Anthony Yen, Jason Yee, Mico Chu, Steven Fu, Eros Huang, Debbie Yeh

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474260

KEYWORDS: Plasma, Plasma etching, Etching, Plasma treatment, Metrology, Critical dimension metrology, Photoresist materials, Process control, Ions, Scanning electron microscopy

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Showing 5 of 6 publications

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