Eunsoo Jeong
at Dongbu HiTek Co Ltd
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 24 March 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Wafer-level optics, Metrology, Inspection, Photomasks, Artificial intelligence, SRAF, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Image resolution, Photomasks, Critical dimension metrology, Line edge roughness, Edge roughness, Resolution enhancement technologies

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Silicon, Photomasks, Double patterning technology, Photoresist processing, Thermal oxidation, Oxidation

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Etching, Image processing, Resistance, Image resolution, Image analysis, Photomasks, Critical dimension metrology, Failure analysis, Edge roughness

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Image processing, Silicon, Photomasks, Double patterning technology, Resolution enhancement technologies, Oxidation

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top