Dr. Fadi Salameh Batarseh Profile

Dr. Fadi Salameh Batarseh

at GLOBALFOUNDRIES Inc

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Author

Publications (9)

Proceedings Article | 23 March 2020 Presentation + Paper

Dynamic pattern matching flow to enable low escape rate weak point detection

Uwe Paul Schroeder, Janam Bakshi, Ahmed Mounir Elsemary, Fadi Batarseh

Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV

KEYWORDS: Lithography, Databases, Metals, Printing, Machine learning, Image classification, Optical proximity correction, Digital electronics

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Proceedings Article | 4 April 2018 Presentation + Paper

Litho friendly via insertion with in-design auto-fix flow using machine learning

Ahmed Mounir Elsemary, Moutaz Fakhry, Janam Bakshi, Nishant Shah, Mohamed Ismail, Fadi Batarseh, Uwe Paul Schroeder, Ahmed Mohyeldin, Jason Cain

Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII

KEYWORDS: Lithography, Optical lithography, Metals, Pattern recognition, Manufacturing, Design for manufacturing, Machine learning, Image classification, Library classification systems

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Proceedings Article | 16 October 2017 Paper

Aerial image ORC checks and their correlation to wafer-edge yield limitation for metals: a study and an OPC resolution

Tamer Desouky, Yixiao Zhang, Mark Terry, Haizhou Yin, Muhammed Pallachali, Nicolai Petrov, Teck Jung Tang, Fadi Batarseh, Ahmed Khalil, Pietro Babighian, Rohan Deshpande, Deborah Ryan, Rao Desineni, Shweta Shokale, Feng Wang, Sang-Kee Eah, Jiechang Hou

Proc. SPIE. 10451, Photomask Technology 2017

KEYWORDS: Lithography, Metals, Silicon, Scanning electron microscopy, Design for manufacturing, Optical proximity correction, Semiconducting wafers

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Proceedings Article | 16 March 2016 Paper

Methodology to extract, data mine and score geometric constructs from physical design layouts for analysis and applications in semiconductor manufacturing

Piyush Pathak, Karthik Krishnamoorthy, Wei-Long Wang, Ya-Chieh Lai, Frank Gennari, Shikha Somani, Bob Pack, Uwe Paul Schroeder, Fadi Batarseh, Jaime Bravo, Jason Sweis, Philippe Hurat, Sriram Madhavan

Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X

KEYWORDS: Semiconductors, Data mining, Lithography, Databases, Metals, Silicon, Manufacturing, Computer simulations, Mining, Design for manufacturing, Machine learning, Semiconductor manufacturing, Image classification, Charge-coupled devices, Optical proximity correction, Design for manufacturability

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Proceedings Article | 18 March 2015 Paper

VLSI physical design analyzer: A profiling and data mining tool

Shikha Somani, Piyush Verma, Sriram Madhavan, Fadi Batarseh, Robert Pack, Luigi Capodieci

Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX

KEYWORDS: Data mining, Statistical analysis, Data modeling, Visualization, Data storage, Databases, Metals, Data processing, Profiling, Very large scale integration

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Proceedings Article | 18 March 2015 Paper

Hybrid OPC flow with pattern search and replacement

Piyush Verma, Shikha Somani, Yang Ping, Piyush Pathak, Rani Ghaida, Carl Babcock, Fadi Batarseh, Jingyu Wang, Sriram Madhavan, Sarah McGowan

Proc. SPIE. 9426, Optical Microlithography XXVIII

KEYWORDS: Photovoltaics, Optical lithography, Data modeling, Very large scale integration, Photomasks, Image classification, Optical proximity correction, SRAF, Model-based design, Library classification systems

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Proceedings Article | 8 October 2014 Paper

Efficient full-chip QA Tool for design to mask (D2M) feature variability verification

Fadi Batarseh, Piyush Verma, Robert Pack, Shikha Somani

Proc. SPIE. 9235, Photomask Technology 2014

KEYWORDS: Ions, Profiling, Photomasks, Image classification, Optical proximity correction, Critical dimension metrology, Structural design, Neodymium, Product engineering, Library classification systems

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Proceedings Article | 8 October 2014 Paper

Model-based virtual VSB mask writer verification for efficient mask error checking and optimization prior to MDP

Robert Pack, Keith Standiford, Todd Lukanc, Guo Xiang Ning, Piyush Verma, Fadi Batarseh, Gek Soon Chua, Akira Fujimura, Linyong Pang

Proc. SPIE. 9235, Photomask Technology 2014

KEYWORDS: Lithography, Data modeling, Error analysis, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Vestigial sideband modulation

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Proceedings Article | 8 October 2014 Paper

Pattern-based pre-OPC operation to improve model-based OPC runtime

Piyush Verma, Fadi Batarseh, Shikha Somani, Jingyu Wang, Sarah McGowan, Sriram Madhavan

Proc. SPIE. 9235, Photomask Technology 2014

KEYWORDS: Lithography, Logic, Computer simulations, Very large scale integration, Photomasks, Image classification, Optical proximity correction, Optics manufacturing, Model-based design, Library classification systems

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Showing 5 of 9 publications

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