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Fei Gao
at ACADEMY OF OPTO-ELECTRONICS,CHINESE ACADEMY OF SCI
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Publications (1)
Proceedings Article | 15 October 2015 Paper
Echelle and etalon used for spectral metrology of excimer laser lithographic light sources at 193nm
Fei Gao, Jiangshan Zhao, Guangyi Liu, Qian Wang, Lujun Bai
Proceedings Volume 9673, 96730O (2015) https://doi.org/10.1117/12.2199380
KEYWORDS: Fabry–Perot interferometers, Excimer lasers, Lithography, Metrology, 193nm lithography, Charge-coupled devices, Light sources, Laser applications, Diffraction, Spectral resolution
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