Fei Wang
at HMI
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Defect detection, Image processing, Electrons, Inspection, Optical inspection, Semiconductor manufacturing, System integration, Semiconducting wafers, Image quality standards, Defect inspection

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Semiconductors, Defect detection, Inspection, Computing systems, Optical inspection, Image quality, Photomasks, Extreme ultraviolet, Semiconductor manufacturing, Semiconducting wafers

Proceedings Article | 3 October 2018 Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Defect detection, Inspection, Computing systems, Scanning electron microscopy, Wafer inspection, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

Proceedings Article | 22 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, Error analysis, Scanning electron microscopy, Time metrology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 13 March 2018 Presentation + Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Electron beams, Metrology, Logic, Scanners, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Showing 5 of 15 publications
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