CONFERENCE PROCEEDINGS
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Fen Xue
at Semiconductor Manufacturing International Corp.
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Author
Publications (4)
Proceedings Article | 26 September 2019 Paper
Lithography printability review: an application on advanced photomask production for enhancing mask yield and cycle time
Proceedings Volume 11148, 1114812 (2019) https://doi.org/10.1117/12.2536494
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Lithography, Mask making, Optical proximity correction, Manufacturing, Defect inspection, Scanners, Computer simulations
Proceedings Article | 26 September 2019 Paper
High temperature baking process study in advanced mask cleaning
Dejian Li, Fen Xue, Cong Lu, Wenjun Ling, Xuefei Qin, Jie Wang
Proceedings Volume 11148, 1114816 (2019) https://doi.org/10.1117/12.2536622
KEYWORDS: Photomasks, Ions, Air contamination, Distortion, Mask making, Semiconducting wafers, Image registration, Mask cleaning, Scanning electron microscopy, Image processing
Proceedings Article | 3 October 2018 Paper
Pattern edge roughness study on OMOG mask repair
Proceedings Volume 10810, 108100Z (2018) https://doi.org/10.1117/12.2501753
KEYWORDS: Plasma, Etching, Edge roughness, Oxides, Photomasks, Oxygen, Distortion, Plasma etching
Proceedings Article | 3 October 2018 Paper
A study of the TMAH based clean performance on advanced photomask
Proceedings Volume 10810, 108101B (2018) https://doi.org/10.1117/12.2500804
KEYWORDS: Photomasks, SRAF, Particles, Critical dimension metrology, Semiconductors, Mask cleaning, Lithography
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