Prof. Feng Shao Profile

Prof. Feng Shao

at Fraunhofer-IISB

SPIE Involvement:

Author

Publications (16)

SPIE Journal Paper | 1 March 2013

Efficient simulation of extreme ultraviolet multilayer defects with rigorous data base approach

Peter Evanschitzky, Feng Shao, Andreas Erdmann

JM3, Vol. 12, Issue 02, 021005, (March 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.2.021005

KEYWORDS: Extreme ultraviolet, Computer simulations, Waveguides, Photomasks, Diffraction, Multilayers, Data modeling, Matrices, Electromagnetism, Finite-difference time-domain method

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Proceedings Article | 8 November 2012 Paper

Efficient simulation of EUV multilayer defects with rigorous data base approach

Peter Evanschitzky, Feng Shao, Andreas Erdmann

Proceedings Volume 8522, 85221S (2012) https://doi.org/10.1117/12.964282

KEYWORDS: Extreme ultraviolet, Waveguides, Computer simulations, Ions, Diffraction, Neodymium, Photomasks, Cadmium sulfide, Polonium, Data storage

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Proceedings Article | 5 October 2011 Paper

Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects

Andreas Erdmann, Peter Evanschitzky, Feng Shao, Tim Fühner, Gian Lorusso, Eric Hendrickx, Mieke Goethals, Rik Jonckheere, Tristan Bret, Thorsten Hofmann

Proceedings Volume 8171, 81710M (2011) https://doi.org/10.1117/12.896813

KEYWORDS: Calibration, Photomasks, Data modeling, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Diffusion, Semiconducting wafers, Projection systems

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Proceedings Article | 23 March 2011 Paper

Compensation of mask induced aberrations by projector wavefront control

Peter Evanschitzky, Feng Shao, Tim Fühner, Andreas Erdmann

Proceedings Volume 7973, 797329 (2011) https://doi.org/10.1117/12.879207

KEYWORDS: Projection systems, Photomasks, Monochromatic aberrations, Wavefronts, Diffraction, Imaging systems, Extreme ultraviolet, Lithography, Semiconducting wafers, EUV optics

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Proceedings Article | 23 March 2011 Paper

Accuracy and performance of 3D mask models in optical projection lithography

Viviana Agudelo, Peter Evanschitzky, Andreas Erdmann, Tim Fühner, Feng Shao, Steffen Limmer, Dietmar Fey

Proceedings Volume 7973, 79730O (2011) https://doi.org/10.1117/12.879053

KEYWORDS: Photomasks, 3D modeling, Diffraction, Polarization, Systems modeling, Performance modeling, Lithography, Lithographic illumination, Projection lithography, Projection systems

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Proceedings Article | 26 May 2010 Paper

Fast and highly accurate simulation of the printing behavior of EUV multilayer defects based on different models

Feng Shao, Peter Evanschitzky, Kristian Motzek, Andreas Erdmann

Proceedings Volume 7748, 774806 (2010) https://doi.org/10.1117/12.866470

KEYWORDS: Waveguides, Photomasks, Critical dimension metrology, Extreme ultraviolet, Computer simulations, Refractive index, Calibration, Printing, Finite-difference time-domain method, Diffraction

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Proceedings Article | 11 March 2010 Paper

Modeling of exploration of reversible contrast enhancement layers for double exposure lithography

Feng Shao, Gregory Cooper, Zhiyun Chen, Andreas Erdmann

Proceedings Volume 7640, 76400J (2010) https://doi.org/10.1117/12.846525

KEYWORDS: Photoresist materials, Lithography, Refractive index, Diffraction, Modulation, Nanoimprint lithography, Absorption, Nanocrystals, Nonlinear optics, Computer simulations

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Proceedings Article | 10 March 2010 Paper

Topography-aware BARC optimization for double patterning

Shijie Liu, Tim Fühner, Feng Shao, Aliaksandr Barenbaum, Johannes Jahn, Andreas Erdmann

Proceedings Volume 7640, 76403C (2010) https://doi.org/10.1117/12.846441

KEYWORDS: Modulation, Reflectivity, Refractive index, Double patterning technology, Lithography, Optimization (mathematics), Manufacturing, Optical properties, Genetic algorithms, Critical dimension metrology

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Proceedings Article | 4 March 2010 Paper

Modeling of double patterning interactions in litho-cure-litho-etch (LCLE) processes

Andreas Erdmann, Feng Shao, Juergen Fuhrmann, Andre Fiebach, George Patsis, Peter Trefonas

Proceedings Volume 7640, 76400B (2010) https://doi.org/10.1117/12.845849

KEYWORDS: Lithography, Diffusion, Photoresist processing, Double patterning technology, Semiconducting wafers, Algorithm development, Refractive index, Photoresist materials, Computer simulations, Image processing

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SPIE Journal Paper | 1 October 2009

Efficient simulation and optimization of wafer topographies in double patterning

Feng Shao, Peter Evanschitzky, Tim Fühner, Andreas Erdmann

JM3, Vol. 8, Issue 04, 043070, (October 2009) https://doi.org/10.1117/12.10.1117/1.3275723

KEYWORDS: Semiconducting wafers, Photomasks, Diffraction, Waveguides, Lithography, Refractive index, Computer simulations, Optical proximity correction, Reflectivity, Photoresist materials

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Proceedings Article | 30 September 2009 Paper

Efficient analysis of three dimensional EUV mask induced imaging artifacts using the waveguide decomposition method

Feng Shao, Peter Evanschitzky, Tim Fühner, Andreas Erdmann

Proceedings Volume 7488, 74882C (2009) https://doi.org/10.1117/12.833464

KEYWORDS: Photomasks, Diffraction, Waveguides, Extreme ultraviolet, Optical proximity correction, Extreme ultraviolet lithography, Lithographic illumination, Lithography, 3D image processing, Stereoscopy

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Proceedings Article | 17 June 2009 Paper

Lithography simulation: modeling techniques and selected applications

Andreas Erdmann, Tim Fühner, Feng Shao, Peter Evanschitzky

Proceedings Volume 7390, 739002 (2009) https://doi.org/10.1117/12.829409

KEYWORDS: Lithography, Photomasks, Photoresist materials, Diffraction, Semiconducting wafers, Computer simulations, Double patterning technology, Photoresist developing, Optimization (mathematics), Absorption

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Proceedings Article | 16 March 2009 Paper

Efficient simulation and optimization of wafer topographies in double patterning

Feng Shao, Peter Evanschitzky, Tim Fühner, Andreas Erdmann

Proceedings Volume 7274, 72740O (2009) https://doi.org/10.1117/12.814176

KEYWORDS: Semiconducting wafers, Photomasks, Diffraction, Lithography, Waveguides, Refractive index, Double patterning technology, Optical proximity correction, Reflectivity, Photoresist materials

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Proceedings Article | 16 March 2009 Paper

Exploration of linear and non-linear double exposure techniques by simulation

John Petersen, Robert Greenway, Tim Fühner, Peter Evanschitzky, Feng Shao, Andreas Erdmann

Proceedings Volume 7274, 72741V (2009) https://doi.org/10.1117/12.814411

KEYWORDS: Remote sensing, Double patterning technology, Optical lithography, Current controlled current source, Superposition, Lithography

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Proceedings Article | 2 May 2008 Paper

Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique

Feng Shao, Peter Evanschitzky, David Reibold, Andreas Erdmann

Proceedings Volume 6792, 679206 (2008) https://doi.org/10.1117/12.798519

KEYWORDS: Photomasks, Waveguides, Computer simulations, Extreme ultraviolet, Diffraction, Near field optics, EUV optics, Near field, Electromagnetism, Optical simulations

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Proceedings Article | 30 October 2007 Paper

Simulation of larger mask areas using the waveguide method with fast decomposition technique

Peter Evanschitzky, Feng Shao, Andreas Erdmann, David Reibold

Proceedings Volume 6730, 67301P (2007) https://doi.org/10.1117/12.746631

KEYWORDS: Computer simulations, 3D image processing, Waveguides, Extreme ultraviolet, Near field, Photomasks, 3D modeling, Near field optics, Electromagnetism, EUV optics

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Showing 5 of 16 publications

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