Dr. Francis Goodwin
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 19 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Diffraction, Scanners, Error analysis, Wavefronts, Zernike polynomials, Photomasks, Extreme ultraviolet lithography, Aberration theory, Overlay metrology

Proceedings Article | 16 October 2017 Paper
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Temporal coherence, Particles, Nickel, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Nanoimprint lithography

Proceedings Article | 30 March 2017 Presentation + Paper
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Logic, Optical lithography, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Computational lithography, Optical proximity correction, Nanoimprint lithography, Tolerancing, Stochastic processes, Back end of line, Design for manufacturability

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Wafer-level optics, Lithography, Metrology, Inspection, Optical metrology, Process control, Finite element methods, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Optics manufacturing, Defect inspection

Proceedings Article | 27 March 2017 Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Reflectors, Statistical analysis, Data modeling, Silicon, Reflectivity, Surface roughness, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Molybdenum, Electromagnetic theory, Scanning tunneling microscopy

Showing 5 of 6 publications
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