Franck Foussadier
RET Engineer at STMicroelectronics
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Optical lithography, Calibration, Etching, Metals, Image processing, Reliability, 3D modeling, Scanning electron microscopy, 3D metrology, Photomasks, Artificial intelligence, Optical proximity correction, Critical dimension metrology, Evolutionary algorithms

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Lithium, Scanning electron microscopy, Photomasks, Image enhancement, Source mask optimization, Computational lithography, Optical proximity correction, SRAF, Resolution enhancement technologies

Proceedings Article | 8 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Genetic algorithms, Detection and tracking algorithms, Computer simulations, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Lanthanum, Standards development

Proceedings Article | 3 April 2010 Paper
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Statistical analysis, Etching, Inspection, Control systems, Finite element methods, Wafer inspection, Optical proximity correction, Optical alignment, Semiconducting wafers, Defect inspection

Proceedings Article | 23 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Data modeling, Calibration, Reliability, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Optics manufacturing, Fuzzy logic, Mahalanobis distance

Showing 5 of 20 publications
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