Mr. Frank Erber Profile

Frank Erber

at Advanced Mask Technology Ctr

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Author

Publications (2)

Proceedings Article | 1 November 2007 Paper

Pellicle dimensions for high NA photomasks

Frank Erber, Thomas Schulmeyer, Christian Holfeld

Proc. SPIE. 6730, Photomask Technology 2007

KEYWORDS: Lithography, Image processing, Scanners, Manufacturing, Inspection, Image registration, Pellicles, Inspection equipment, Photomasks, Sodium

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Proceedings Article | 5 September 2001 Paper

Development and characterization of a new plasma etching process for mask manufacturing

Frank Erber, Guenther Ruhl, C. Ebi, Ralf Dietrich, Josef Mathuni, Pavel Nesladek

Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII

KEYWORDS: Etching, Dry etching, Manufacturing, Scanning electron microscopy, Photoresist materials, Photomasks, Plasma etching, Critical dimension metrology, Photoresist processing, Plasma

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