Frank Erber
at Advanced Mask Technology Ctr
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 1 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Image processing, Scanners, Manufacturing, Inspection, Image registration, Pellicles, Inspection equipment, Photomasks, Sodium

Proceedings Article | 5 September 2001 Paper
Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII
KEYWORDS: Etching, Dry etching, Manufacturing, Scanning electron microscopy, Photoresist materials, Photomasks, Plasma etching, Critical dimension metrology, Photoresist processing, Plasma

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