Chi-hao Huang
at Macronix International Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Wafer-level optics, Optical filters, Metrology, Detection and tracking algorithms, Etching, Inspection, Optical testing, Optical metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Oxides, Lithography, Optical lithography, Etching, Scanners, Chemical vapor deposition, Plasma enhanced chemical vapor deposition, Optical alignment, Critical dimension metrology, Mass attenuation coefficient, Semiconducting wafers, Overlay metrology

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Modulation, Manufacturing, Process control, Compact discs, Critical dimension metrology, 3D equipment, Line edge roughness, Photoresist processing, Semiconducting wafers, Edge roughness

Proceedings Article | 8 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Optical lithography, Defect detection, Etching, Image processing, Scanners, Diffusion, Distortion, Scanning electron microscopy, Process control, Compact discs, Critical dimension metrology, Semiconducting wafers, Temperature metrology

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