Dr. Frank Katzwinkel
at Qimonda Dresden GmbH & Co OHG
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 25 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Defect detection, Inspection, Printing, Wafer inspection, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Defect inspection

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Manufacturing, Inspection, Scanning electron microscopy, Printing, Solids, Photomasks, Critical dimension metrology, Halftones, Semiconducting wafers

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Etching, Numerical simulations, Image registration, Thermal effects, Photomasks, Semiconducting wafers, Data analysis

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top