Dr. Frank Scholze
Head of Group "EUV Radiometry" at Physikalisch-Technische Bundesanstalt
SPIE Involvement:
Area of Expertise:
EUV radiometry , X-ray detectors , EUV scatterometry , EUV reflectometry , multilayer mirrors
Profile Summary

born 30.09.1961 Berlin,
1982-1987 Physics studies at TU Dresden, graduated with a work on x-ray fluorescence analysis,
1987-1991 working on x-ray detectors at the Centre for scientific instrumentation of the Academy of Sciences,
since 1991 with the X-ray radiometry laboratory of PTB at BESSY
1997 PhD at TU Berlin, internal quantum yield of silicon in the soft X-ray spectral range
working on EUV and soft x-ray detector calibration and optical components characterization,
development of measurement methods for the characterization of components for EUV Lithography
and x-ray scattering methods for the characterization of structured surfaces.
Head of the working group for EUV radiometry.
Publications (113)

Proceedings Article | 21 September 2020 Presentation
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Semiconductors, Reticles, Contamination, Scanners, X-rays, Photomasks, Integrated circuits, Extreme ultraviolet lithography, Semiconducting wafers, Ruthenium

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Diffraction, Scattering, X-rays, Inverse problems, Finite element methods

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Optical properties, Databases, X-rays, Reflectivity, Refraction, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Absorption

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Oxidation

Proceedings Article | 21 June 2019 Presentation + Paper
Proc. SPIE. 11057, Modeling Aspects in Optical Metrology VII
KEYWORDS: Oxides, Nanostructures, Sensors, Luminescence, X-rays, Silicon, Finite element methods, Particle swarm optimization, Optimization (mathematics), X-ray fluorescence spectroscopy

Showing 5 of 113 publications
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