Frank Staals
System Engineer
SPIE Involvement:
Author
Area of Expertise:
Lithography , Focus , Imaging
Publications (7)

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Diffraction, Metrology, Logic, Deep ultraviolet, Scanners, Control systems, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 16 March 2016 Paper
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Reticles, Optical lithography, Data modeling, Visualization, Sensors, Scanners, Manufacturing, Image resolution, Time metrology, Photomasks, Semiconducting wafers, Product engineering, Performance modeling, Chemical mechanical planarization, Design for manufacturability

Proceedings Article | 8 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Metrology, Optical lithography, Data modeling, Calibration, Scanners, Interfaces, Inspection, Photoresist materials, Process control, Finite element methods, Semiconducting wafers

Proceedings Article | 4 September 2015 Paper
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Logic, Optical lithography, Sensors, Scanners, Printing, Photomasks, Semiconducting wafers, Product engineering, Electroluminescent displays, Polonium

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Metrology, Optical lithography, Etching, Scanners, Computer simulations, Scatterometry, Optical metrology, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Showing 5 of 7 publications
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