Frank van de Mast
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Accuracy assessment, Overlay metrology, Physics, Image processing, Process control, Optical properties, Polarization, Metrology, Inspection, Diffraction gratings, Semiconducting wafers, Computer simulations, Diffraction, Detection theory

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Overlay metrology, Semiconducting wafers, Machine learning, Metrology, Scanners, Sensors, Control systems, Optical alignment, Time metrology, Neural networks

Proceedings Article | 13 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Semiconducting wafers, Overlay metrology, Computer programming, Optical alignment, Sensors, Interferometers, Reticles, Optical lithography, Metrology, Calibration

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Semiconducting wafers, Computer programming, Lithography, Interferometers, Optical alignment, Time metrology, Overlay metrology, Metrology, Reticles, Refractive index

Proceedings Article | 26 June 2003 Paper
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Imaging systems, Photomasks, Semiconducting wafers, Control systems, Binary data, Reticles, Optics manufacturing, Critical dimension metrology, Phase shifts, Distortion

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