Prof. Albert M. Brouwer Profile

Prof. Albert M. Brouwer

Professor at ARCNL

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 1 May 2023 Presentation + Paper

Influence of the anion in tin-based EUV photoresists properties

Quentin Evrard, Najmeh Sadegh, Chao Chun Hsu, Nicola Mahne, Angelo Giglia, Stefano Nannarone, Yasin Ekinci, Michaela Vockenhuber, Akira Nishimura, Tsuyoshi Goya, Takuo Sugioka, Albert Brouwer

Proceedings Volume 12498, 124980Z (2023) https://doi.org/10.1117/12.2658498

KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, X-ray photoelectron spectroscopy, Extreme ultraviolet, Tin, Optical lithography, Materials properties, Lithography

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SPIE Journal Paper | 10 May 2018

Absorption coefficient of metal-containing photoresists in the extreme ultraviolet

Roberto Fallica, Jarich Haitjema, Lianjia Wu, Sonia Castellanos Ortega, Albert Brouwer, Yasin Ekinci

JM3, Vol. 17, Issue 02, 023505, (May 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.2.023505

KEYWORDS: Absorption, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Tin, Zirconium, Metals, Lithography, Oxides, Chemical elements

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SPIE Journal Paper | 15 September 2017 Open Access

Extreme ultraviolet patterning of tin-oxo cages

Jarich Haitjema, Yu Zhang, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci, Albert Brouwer

JM3, Vol. 16, Issue 03, 033510, (September 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.033510

KEYWORDS: Optical lithography, Extreme ultraviolet, Tin, Extreme ultraviolet lithography, Photoresist materials, Lithography, Absorption, Silicon, Molecules, Chemical species

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SPIE Journal Paper | 22 June 2017 Open Access

Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy

Yu Zhang, Jarich Haitjema, Xiaomeng Liu, Fredrik Johansson, Andreas Lindblad, Sonia Castellanos, Niklas Ottosson, Albert Brouwer

JM3, Vol. 16, Issue 02, 023510, (June 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.023510

KEYWORDS: Deep ultraviolet, Hard x-rays, Photoemission spectroscopy, Photoresist materials, Extreme ultraviolet lithography, Oxidation, Chemical species, Extreme ultraviolet, Absorption, 3D modeling

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Proceedings Article | 27 March 2017 Paper

Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy

Yu Zhang, Jarich Haitjema, Xiaomeng Liu, Fredrik Johansson, Andreas Lindblad, Sonia Castellanos, Niklas Ottosson, Albert Brouwer

Proceedings Volume 10146, 1014606 (2017) https://doi.org/10.1117/12.2257893

KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Chemical species, Spectroscopy, Tin, Hard x-rays, Photoemission spectroscopy, Photochemistry, Chemical reactions, Electrons, Oxidation, Deep ultraviolet, Oxygen, Molecules

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Proceedings Article | 24 March 2017 Presentation + Paper

Absorption coefficient and exposure kinetics of photoresists at EUV

Roberto Fallica, Jarich Haitjema, Lianjia Wu, Sonia Castellanos, Fred Brouwer, Yasin Ekinci

Proceedings Volume 10143, 101430A (2017) https://doi.org/10.1117/12.2257240

KEYWORDS: Absorption, Quantum efficiency, Extreme ultraviolet lithography, Chemically amplified resists, Photoresist materials, Lithography, Polymethylmethacrylate, Light sources, Chemical analysis, Tin, Metals, Extreme ultraviolet, Oxides, Polymers, Zirconium, Transmittance

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Proceedings Article | 24 March 2017 Paper

Extreme ultraviolet patterning of tin-oxo cages

Jarich Haitjema, Yu Zhang, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci, Albert Brouwer

Proceedings Volume 10143, 1014325 (2017) https://doi.org/10.1117/12.2257911

KEYWORDS: Photoresist materials, Extreme ultraviolet, Absorption, Infrared spectroscopy, Extreme ultraviolet lithography, Spectroscopy, Tin, Optical lithography, Lithography, Silicon, Thin films, Stochastic processes

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Showing 5 of 7 publications

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